Physics / Fizik

Permanent URI for this collectionhttps://hdl.handle.net/11147/6

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Access type: Open accessInstitution Author: search.filters.institutionAuthor.Güneş, Mehmet

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  • Conference Object
    Native and Light Induced Defect States in Wide Band Gap Hydrogenated Amorphous Silicon-Carbon (a-Si1 : H) Alloy Thin Films
    (Springer, 1997) Güneş, Mehmet
    In this study, wide band gap a-Si1-x C-x:H alloy thin films prepared with and without hydrogen diluation of (SiH4, CH4) were characterized using optical absorption, dark conductivity, steady-state photoconductivity, sub-bandgap absorption obtained with both photothermal deflection spectroscopy (PDS) and dual beam photoconductivity (DBP), and electron spin resonance (ESR) techniques. Experimental results of steady-state photoconductivity and sub-bandgap absorption for different generation rates were analyzed using a detailed numerical model based on Simmons-Taylor statistics. The densities, energy location and nature of the native and light induced defect states in diluted and undiluted a-Si1-xCx:H alloy thin films were derived from the best fits to the experimental data. The extracted parameters for defect states were compared with those of a-Si:H films both in the annealed and light degraded states.
  • Article
    Citation - WoS: 13
    Noise in Hydrogenated Amorphous Silicon
    (Institute of Electrical and Electronics Engineers, 2002) Johanson, Robert E.; Güneş, Mehmet; Kasap, Safa O.
    Published work on conductance fluctuations in hydrogenated amorphous silicon is surveyed. There are many reports of 1/f noise. some describing unusual features Such as non-Gaussian statistics. The relative insensitivity to doping and temperature is highlighted. In addition to the 1/f noise. random-telegraph-like noise is often reported. The successes and failures of generation-recombination models for 1 f noise and current filament models for the telegraph noise are summarised.
  • Article
    Citation - WoS: 4
    Citation - Scopus: 5
    Conductance Fluctuations in Undoped Hydrogenated Amorphous Silicon-Germanium Alloy Thin Films
    (Elsevier Ltd., 2002) Güneş, Mehmet; Johanson, Robert E.; Kasap, Safa O.; Yang, Jeffrey C.; Guha, Subhendu
    We report coplanar conductance fluctuations of device quality, undoped hydrogenated amorphous silicon-germanium alloy thin films (a-SiGe:H) measured from 430 to 490 K. The a-SiGe:H alloys produce noise power spectra similar to coplanar undoped a-Si:H films in the same temperature range. The noise power spectrum S(n) does not fit a single 1/fα power law but rather has two distinct regions, each accurately fitted by a power law, but with different slopes. The low frequency slope α1 is similar to that observed in undoped a-Si:H films varying from 1.30 to 1.46 for different Ge concentrations and shows a slight temperature dependence. At higher frequencies, the slope α2 is less than unity and temperature independent but depends on the Ge content of the film. α2 decreases from 0.60 for no Ge (pure a-Si:H) to 0.15 for 40 at.% Ge. The noise power at lower frequencies increases and at higher frequencies decreases substantially as the temperature increases from 430 to 490 K. We infer that similar noise mechanisms are operating in undoped a-SiGe:H and a-Si:H films but that the Ge content is influencing the noise, particularly the slope at higher frequencies. In addition, the noise has the expected quadratic dependence on bias current and obeys Gaussian statistics.
  • Conference Object
    Citation - WoS: 3
    Citation - Scopus: 3
    1/F Noise in Amorphous Silicon and Silicon-Germanium Alloys
    (SPIE, 2003) Johanson, Robert E.; Güneş, Mehmet; Kasap, Safa O.
    We report measurements of conductance noise of a-Si1-XGeX:H in two different geometries; one where the current flow is transverse to the surface and the other longitudinal to it. Because of the large increase in sample resistance in going from transverse to longitudinal conduction, it was not possible to measure both geometries at the same temperature. However, the temperature trends are compatible with a common noise source. For both geometries, alloying with up to 40% Ge reduces the noise magnitude by a factor of 50 over that found in a-Si:H
  • Article
    Citation - WoS: 11
    Citation - Scopus: 11
    The Effects of Native and Light Induced Defects on Optoelectronic Properties of Hydrogenated Amorphous Silicon-Germanium (a-Sige:h) Alloy Thin Films
    (Springer Verlag, 2010) Güneş, Mehmet; Yavaş, Mert; Klomfaß, Josef; Finger, Friedhelm
    Effects of native and light induced defects states in hydrogenated amorphous silicon-germanium alloy thin films with different Ge concentrations have been investigated by using steady-state photoconductivity, dual beam photoconductivity (DBP), transmission spectroscopy and photothermal deflection spectroscopy (PDS) techniques. In the annealed state, sub-bandgap absorption spectra obtained from both PDS and DBP overlap very well at energies above 1.4 eV. However, differences in α (hν) spectrum exist in the lower energy part of absorption spectrum. The α (hν) value measured at 1.0 eV is the lowest for 10% Ge sample and increases gradually as Ge content of the sample increases. In the light soaked state, time dependence of photoconductivity decay obeys to t -x power law, where x changes from 0.30 to 0.60 for samples with low Ge content and 0.05-0.1 for samples with high Ge content. Correspondingly, the increase of the sub-bandgap absorption coefficient at lower energies obeys to t y power law, where y values are lower than the x value of the same sample. It can be inferred that sub-bandgap absorption and photoconductivity measurements are not controlled by the same set of defects created in the bandgap of alloys. © 2009 Springer Science+Business Media, LLC.
  • Conference Object
    Citation - WoS: 6
    Citation - Scopus: 9
    Sub-Bandgap Optical Absorption Spectroscopy of Hydrogenated Microcrystalline Silicon Thin Films Prepared Using Hot-Wire Cvd (cat-Cvd) Process
    (Elsevier Ltd., 2006) Göktaş, Oktay; Işık, Nebile; Okur, Salih; Güneş, Mehmet; Carius, Reinhard; Klomfaß, Josef; Finger, Friedhelm
    Hydrogenated microcrystalline silicon (μc-Si:H) thin films with different silane concentration (SC) have been prepared using the HW-CVD technique. Dual beam photoconductivity (DBP), photothermal deflection spectroscopy (PDS), and transmission measurements have been used to investigate the optical properties of the μc-Si:H films. Two different sub-bandgap absorption, α(hν), methods have been applied and analyzed to obtain a better insight into the electronic states involved. A good agreement has been obtained in the absorption spectrum obtained from the PDS and DBP measurements at energies above the bandgap. Differences between PDS and DBP spectra exist below the bandgap energy where DBP spectra always give lower α(hν) values and show a dependence on the SC. For some films, differences exist in the α(hν) spectra when the DBP measurements are carried out through the film and substrate side. In addition, for some films, there remains fringe pattern left on the spectrum after the calculation of the fringe-free absorption spectrum, which indicates structural inhomogeneities present throughout the film.
  • Conference Object
    Citation - WoS: 8
    Citation - Scopus: 9
    Diffusion Length Measurements of Microcrystalline Silicon Thin Films Prepared by Hot-wire/Catalytic Chemical Vapor Deposition (hwcvd)
    (Elsevier Ltd., 2006) Okur, Salih; Güneş, Mehmet; Finger, Friedhelm; Carius, Reinhard
    Hydrogenated microcrystalline silicon (μc-Si:H) films prepared by using the hot-wire/catalytic chemical vapor deposition (HWCVD) technique at low substrate temperatures between 185 °C and 220 °C with different silane concentrations (SC) were investigated using steady-state photocarrier grating (SSPG) and the steady-state photoconductivity methods (SSPC). Crystalline volume fractions (IC RS) obtained from Raman spectroscopy change from 0.22 to 0.77. The diffusion length (LD) is measured at generation rates between G = 1019 and 1021 cm- 3 s- 1. LD changes from 27 nm to 270 nm, with maximum values around SC = 5%. The dependence of LD on SC is similar to that observed for similar quality microcrystalline silicon films prepared using the VHF-PECVD technique. The grating quality factor, γ0, drops from about 0.9 to 0.5 after transition to the microcrystalline regime as indication of scattering from surface patterns.
  • Conference Object
    Citation - WoS: 1
    Citation - Scopus: 1
    Minority Carrier Properties of Microcrystalline Silicon Thin Films Grown by Hw-Cvd and Vhf-Pecvd Techniques
    (National Institute of Optoelectronics, 2005) Okur, Salih; Göktaş, Oktay; Güneş, Mehmet; Finger, Friedhelm; Carius, Reinhard
    Opto-electronic properties of μc-Si:H films prepared by hot-wire/catalytic chemical vapor deposition (HWCVD) and very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) techniques with various silane concentrations (SC) have been investigated using Raman spectroscopy, the steady-state photocarrier grating technique (SSPG), and the steady-state photoconductivity (SSPC). A correlation between the minority carrier transport properties and the microstructure has been found, using the dependence of the diffusion length (Ld) on the SC and Raman intensity ratio (I c RS) representing crystalline volume fractions. I C RS changes from 0.22 to 0.77. Ld increases with increasing Ic RS. It peaks around 0.5 with a maximum value of 270 nm, then decreases. Similar dependences of Ld on I C RS were obtained for films prepared by both HWCVD and VHF-PECVD. However, the grating quality factor measured on highly crystalline HWCVD films is substantially smaller than that found for VHF-PECVD films, indicating a relatively higher surface roughness present in the highly crystalline HWCVD films.
  • Conference Object
    Citation - WoS: 16
    Citation - Scopus: 17
    Instability Phenomena in Microcrystalline Silicon Films
    (National Institute of Optoelectronics, 2005) Finger, Friedhelm; Carius, Reinhard; Dylla, Thorsten; Klein, Stefan; Okur, Salih; Güneş, Mehmet
    Microcrystalline silicon (μc-Si:H) for solar cell applications is investigated with respect to the material stability upon treatment of the material in various environments, followed by annealing. The material can be separated into two groups: (i) material with high crystalline volume fractions and pronounced porosity which is susceptible to in-diffusion of atmospheric gases, which, through adsorption or oxidation affect the electronic properties and (ii) compact material with high or low crystalline volume fractions which show considerably less or no influence of treatment in atmospheric gases. We report the investigation of such effects on the stability of μc-Si:H films prepared by plasma enhanced chemical vapour deposition and hot wire chemical vapour deposition.
  • Conference Object
    Citation - WoS: 7
    Citation - Scopus: 10
    Sub-Bandgap Absorption Spectroscopy and Minority Carrier Transport Properties of Hydrogenated Microcrystalline Silicon Thin Films
    (National Institute of Optoelectronics, 2005) Güneş, Mehmet; Göktaş, Oktay; Okur, Salih; Işık, Nebile; Carius, Reinhard; Klomfaß, Josef; Finger, Friedhelm
    Hydrogenated microcrystalline silicon thin films have been prepared using HW-CVD and VHF-PECVD techniques with different silane concentrations. The steady-state photoconductivity, dual beam photoconductivity, photothermal deflection spectroscopy and steady-state photocarrier grating (SSPG) methods have been used to investigate the optical and electronic properties of the films. Two different sub-bandgap absorption methods have been applied and analyzed to obtain a better insight into the electronic states involved. For some films, differences existed in the optical absorption spectra when the measurements were carried out through the film side and through the substrate side. In addition, for some films, fringe patterns remained on the spectrum after the calculation of the fringe free absorption spectrum, which indicates that structural inhomogeneities were present throughout the film. Finally, minority carrier diffusion lengths deduced from the SSPG measurements were investigated as a function of the crystalline volume fraction (I c RS) obtained from Raman spectroscopy. The longest diffusion lengths and lowest sub-bandgap absorption coefficients were obtained for films deposited in the region of the transition to the amorphous growth.