Physics / Fizik
Permanent URI for this collectionhttps://hdl.handle.net/11147/6
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Conference Object Native and Light Induced Defect States in Wide Band Gap Hydrogenated Amorphous Silicon-Carbon (a-Si1 : H) Alloy Thin Films(Springer, 1997) Güneş, MehmetIn this study, wide band gap a-Si1-x C-x:H alloy thin films prepared with and without hydrogen diluation of (SiH4, CH4) were characterized using optical absorption, dark conductivity, steady-state photoconductivity, sub-bandgap absorption obtained with both photothermal deflection spectroscopy (PDS) and dual beam photoconductivity (DBP), and electron spin resonance (ESR) techniques. Experimental results of steady-state photoconductivity and sub-bandgap absorption for different generation rates were analyzed using a detailed numerical model based on Simmons-Taylor statistics. The densities, energy location and nature of the native and light induced defect states in diluted and undiluted a-Si1-xCx:H alloy thin films were derived from the best fits to the experimental data. The extracted parameters for defect states were compared with those of a-Si:H films both in the annealed and light degraded states.Article Citation - WoS: 15Citation - Scopus: 141/F-noise Study of Undoped Intrinsic Hydrogenated Amorphous Silicon Thin Films(American Physical Society, 1999) Güneş, Mehmet; Johanson, Robert E.; Kasap, Safa O.Conductance fluctuations in four samples of undoped intrinsic hydrogenated amorphous silicon (a-Si:H) were measured in the temperature range of 450 K to 500 K and for frequencies from 2 Hz to 3 kHz. The noise spectra divide into two regions that each fit a 1/fα power law but with different slope parameters α and different temperature dependences. At low frequencies, α is greater than unity and increases with temperature. At high frequencies, α is near 0.6 and temperature independent, but the noise magnitude decreases rapidly with temperature. We infer from the different dependences on temperature that the noise is generated by two independent mechanisms operating simultaneously in a-Si:H. We also observe that the 1/f noise exhibits a quadratic dependence on bias current and Gaussian statistics.Article Citation - WoS: 37Citation - Scopus: 41Differences in the Densities of Charged Defect States and Kinetics of Staebler-Wronski Effect in Undoped (nonintrinsic) Hydrogenated Amorphous Silicon Thin Films(American Institute of Physics, 1997) Güneş, Mehmet; Wronski, Christopher R.A variety of undoped (nonintrinsic) hydrogenated amorphous silicon (a-Si:H) thin films was studied in greater detail using steady-state photoconductivity, σph, subband-gap absorption, α(hν), steady-state photocarrier grating (SSPG), and electron-spin-resonance (ESR) techniques both in the annealed and stabilized light soaked states. The experimental results were self-consisiently modeled using a detailed numerical analysis. It was found that large differences in the optoelectronic properties of device quality a-Si:H thin films can only be explained using a gap slate distribution which consists of positively charged D+ defect states above the Fermi level, the neutral D0 defect states, and the negatively charged D- defect states below the Fermi level. There are large differences both in the densities of neutral and charged defect states and R ratios in different a-Si:H films in the annealed state. The densities of both neutral and charged defect states increased, however, R ratios decreased in the stabilized light soaked state. Very good agreement was obtained between the densities of neutral defect states measured by ESR and those derived from the numerical analysis in the stabilized light soaked state. The kinetics of the Staebler-Wronski effect was also investigated. There was no direct correlation between the decrease of steady-state photoconductivity and increase of subband-gap absorption. The self-consistent fits to wide range of experimental results obtained with the three Gaussian distributions of charged defect states imply that this model is much better representation of the bulk defect states in undoped hydrogenated amorphous silicon thin films.