Physics / Fizik
Permanent URI for this collectionhttps://hdl.handle.net/11147/6
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Article Citation - WoS: 3Citation - Scopus: 3Mgb2 Superconducting Thin Films Grown by Magnetron Sputtering(National Institute of Optoelectronics, 2007) Ulucan, Savaş; Özyüzer, Lütfi; Okur, SalihIn this study, we report the growth and properties of MgB2 thin films on polycrystalline Al2O3 substrates. A composite MgB2 target was produced by MgB2 and Mg powder mixing, using a hot pressing technique. MgB2 thin films were grown on Al 2O3 substrates by d.c. magnetron sputtering, without heating the substrate. To enhance the superconducting properties of the as-grown films and to increase the crystal quality, an ex-situ anneal process was applied. The crystal structure of the thin films was determined by X-ray diffraction. The resistivity versus temperature of the deposited MgB2 thin films was studied to examine the transition temperatures of the films under various magnetic fields. The effects of the annealing temperature and annealing time on the electrical properties of MgB2 thin films are revealed.Conference Object Citation - WoS: 7Citation - Scopus: 8Properties of Reactive O2 Ion Beam Sputtered Tio2 on Si Wafers(National Institute of Optoelectronics, 2005) Ulucan, Savaş; Özyüzer, Gülnur Aygün; Özyüzer, Lütfi; Eğilmez, Mehmet; Turan, RaşitTiO2 thin films were deposited on silicon (100) p-type wafers, using the reactive ion beam sputtering method in high vacuum as an alternative to conventional Argon ion beam sputtering in an O2 environment. Oxygen ions with 1000 eV energy were formed in a thruster and bombarded a high purity Ti target. The molecules of TiO2 were deposited on a Si (100) wafer at various substrate temperatures. The structural and optical properties were analyzed using Fourier Transform Infrared Spectroscopy in the range of 400-4000 cm-1. An ellipsometer was used to measure the thickness and refractive index of the deposited films. In order to determine the dielectric constant and capacitance of the deposited TiO2, the electrical properties were studied using an MOS capacitor. The effects of substrate temperature and deposition time on the dielectric properties of TiO2 are discussed.