Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7148
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Article Citation - WoS: 35Citation - Scopus: 35Cvd Graphene/Sic Uv Photodetector With Enhanced Spectral Responsivity and Response Speed(Elsevier, 2023) Jehad, Ala K.; Fidan, Mehmet; Ünverdi, Özhan; Çelebi, CemA self-powered, high-performance graphene/Silicon Carbide (G/4H-SiC) ultraviolet Schottky junction photodetector has been fabricated, and the effect of using monolayer and bilayer graphene on the device performance parameters was investigated. P-type graphene sheets were grown by the chemical vapor deposition (CVD) method, while 4H-SiC material consists of an epilayer structure of n-/n+ on bulk n-SiC. Two photodetector devices have been studied, one with monolayer graphene (MLG) and the other with bilayer graphene (BLG). The proposed photodetector structure reveals the highest spectral responsivity known of a G/4H-SiC UV photodetector so far. Electronic and optoelectronic characterizations were done under an ultraviolet wavelength range from 240 to 350 nm. The results show two spectral responsivity maxima (Rmax) at 285 nm and 300 nm wavelengths. Exhibiting two maxima in spectral responsivity and detectivity is caused by the constructive and destructive interference effects of multiple reflections at the SiC epilayer's interfaces. The photodetector devices exhibit high spectral responsivity (R ? 0.09 AW?1), maximum detectivity (D* ? 2.9 × 1012 Jones), and minimum noise equivalent power (NEP ? 0.17 pWHz-1/2) in both devices. Using bilayer graphene instead of monolayer showed no significant change in both the photogenerated current and the spectral responsivity due to the higher absorption coefficient of bilayer graphene, however, it exhibited a significant improvement in the response speed. The response speed was found to increase by 50 % when bilayer graphene was used as a hole collecting electrode in the G/4H-SiC junction. This is because bilayer graphene creates a narrower depletion layer and higher electric field, which promotes efficient charge separation and recombination. © 2023 Elsevier B.V.Article Citation - WoS: 1Citation - Scopus: 2Electron Field Emission From Sic Nanopillars Produced by Using Nanosphere Lithography(AVS Science and Technology Society, 2017) Yeşilpınar, Damla; Çelebi, CemField emitter arrays of silicon carbide based nanopillars with high emitter density were fabricated by using a combination of nanosphere lithography and inductively coupled plasma reactive ion etching techniques. The electron field emission characteristics of the produced nanopillars with two different aspect ratios and geometries were investigated, and the obtained results were compared with each other. The authors found that unlike the samples containing low aspect ratio SiC nanopillars with blunt tip apex, the samples comprising high aspect ratio nanopillars with sharp tip apex generate greater emission currents under lower electric fields. The nanopillars with sharp tip apex produced field emission currents up to 240 μA/cm2 under 17.4 V/μm applied electric field, while the nanopillars with blunt tip apex produced an emission current of 70 μA/cm2. The electric fields required to obtain 10 μA/cm2 current density are found to be 9.1 and 7.2 V/μm for the nanopillars with blunt and sharp tip apex, respectively. Time dependent stability measurements yielded stable electron emission without any abrupt change in the respective current levels of both samples.