Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7148
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Article Citation - WoS: 2Citation - Scopus: 2Impact of Encapsulation Method on the Adsorbate Induced Electrical Instability of Monolayer Graphene(AVS Science and Technology Society, 2019) Kalkan, Sırrı Batuhan; Yanılmaz, Alper; Çelebi, CemMonolayer graphene transferred onto a set of silicon carbide (SiC) substrates was encapsulated with a thin SiO2 film in order to prevent its interaction with atmospheric adsorbates. The encapsulation of graphene samples was realized by using two different thin film growth methods such as thermal evaporation (TE) and state-of-the-art pulsed electron deposition (PED). The encapsulation efficiency of these two techniques on the structural and electrical characteristics of graphene was compared with each other. Scanning electron microscopy (SEM) analysis showed that unlike the SiO2 thin film grown with PED, structural defects like cracks were readily formed on TE grown films due to the lack of surface wettability. The electronic transport measurements revealed that the electrical resistivity of graphene has been increased by two orders of magnitude, and the carrier mobility has been subsequently decreased upon the encapsulation process with the PED method. However, in-vacuum transient photocurrent spectroscopy (TPS) measurements conducted for short periods and a few cycles showed that the graphene layer encapsulated with the PED grown SiO2 film is electrically far more stable than the one encapsulated with TE grown SiO2 film. The results of TPS measurements were related to the SEM images to unravel the mechanism behind the improved electrical stability of graphene samples encapsulated with the PED grown SiO2 film.Article Citation - WoS: 4Citation - Scopus: 4Effect of Aromatic Sams Molecules on Graphene/Silicon Schottky Diode Performance(Electrochemical Society, Inc., 2016) Yağmurcukardeş, Nesli; Aydın, Hasan; Can, Mustafa; Yanılmaz, Alper; Mermer, Ömer; Okur, Salih; Selamet, YusufAu/n-Si/Graphene/Au Schottky diodes were fabricated by transferring atmospheric pressure chemical vapor deposited (APCVD) graphene on silicon substrates. Graphene/n-Si interface properties were improved by using 5-[(3-methylphenyl)(phenyl) amino]isophthalic acid (MePIFA) and 5-(diphenyl)amino]isophthalic acid (DPIFA) aromatic self-assembled monolayer (SAM) molecules. The surface morphologies of modified and non-modified films were investigated by atomic force microscopy and scanning electron microscopy. The surface potential characteristics were obtained by Kelvin-probe force microscopy and found as 0.158 V, 0.188 V and 0,383 V as a result of SAMs modification. The ideality factors of n-Si/Graphene, n-Si/MePIFA/Graphene and n-Si/DPIFA/Graphene diodes were found as 1.07, 1.13 and 1.15, respectively. Due to the chain length of aromatic organic MePIFA and DPIFA molecules, also the barrier height φB values of the devices were decreased. While the barrier height of n-Si/Graphene diode was obtained as 0.931 eV, n-Si/MePIFA/Graphene and n-Si/DPIFA/Graphene diodes have barrier height of 0.820 and 0.720 eV, respectively.