Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection

Permanent URI for this collectionhttps://hdl.handle.net/11147/7148

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  • Article
    Citation - WoS: 11
    Citation - Scopus: 13
    Metal Mesh Filters Based on Ti, Ito and Cu Thin Films for Terahertz Waves
    (Springer Verlag, 2016) Demirhan, Yasemin; Alaboz, Hakan; Özyüzer, Lütfi; Nebioğlu, Mehmet Ali; Takan, Taylan; Altan, Hakan; Sabah, Cumali
    In this study, we have investigated the spectral performance of resonant terahertz (THz) bandpass filters which were produced from thin films with a metal-mesh shape. The aforementioned filters were fabricated from titanium, copper and indium tin oxide thin films on fused silica substrates by UV lithography with an array of cross-shaped apertures. Since the mesh period, cross-arm length and its width specify the spectral characteristics of the filters, we were able to reveal the performance of these filters experimentally using both a THz time domain spectrometer and a Fourier transform infrared spectrometer. A commercial electromagnetic simulation software, CST microwave studio, was used to verify the experimental data. The transmission of the filters are in the range 20–55 % at their relevant center frequencies. To our knowledge this study is the first to show that fabricated patterns based on ITO thin films can be used to filter THz radiation.
  • Article
    Citation - WoS: 24
    Citation - Scopus: 26
    The Fabrication of Thz Emitting Mesas by Reactive Ion-Beam Etching of Superconducting Bi2212 With Multilayer Masks
    (Springer Verlag, 2011) Köseoğlu, Hasan; Türkoğlu, Fulya; Şimşek, Yılmaz; Özyüzer, Lütfi
    Generation of powerful THz radiation from intrinsic Josephson Junctions (IJJs) of Bi2Sr2CaCu2O8+δ (Bi2212) may require mesas with large lateral dimensions. However, there are difficulties in fabrication of perfect rectangular mesas. The lateral angles of mesas should be close to 90 degrees to obtain IJJs with same planar dimensions for synchronization of IJJs. We patterned Ta/photoresist and photoresist/Ta/photoresist masks on Bi2212 and used selectiveionetchingtoovercomethethickphotoresistlayershading on the lateral dimension of mesa during the ion-beam etching. The reactive ion-beam etchings have been done with ion beams of Ar, N2 and O2, and we have obtained mesas about 1 µm with lateral angle of approximately 50 to 75°, which is better than the mesas fabricated with photoresist mask.