Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7148
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Article Citation - WoS: 6Citation - Scopus: 5Structural and Optical Characteristics of Antimony Selenosulfide Thin Films Prepared by Two-Step Method(Springer, 2022) Türkoğlu, Fulya; Ekren, Memduh Emirhan; Cantaş, Ayten; Yakıncı, Kübra; Gündoğan, Hazal; Aygün, Gülnur; Özyüzer, LütfiAntimony triselenide (Sb2Se3) is one of the most promising absorber material choices among the inorganic semiconductors that has attracted much attention today. However, highest recorded efficiencies for Sb2Se3 solar cells are still lower than ideal. Exploring antimony selenosulfide (Sb-2(SxSe1-x)(3)) to increase device performance is one option because some features of alloyed Sb-2(SxSe1-x)(3) depend on composition such as bandgap and band position. In this study, two-step process was used to grow Sb-2(SxSe1-x)(3) thin films. In the first stage, Sb2Se3 thin films were deposited on soda lime glass substrates using direct current magnetron sputtering technique. In the second stage, Sb2Se3 thin films were exposed to sulfurization process in a quartz ampoule to obtain Sb-2(SxSe1-x)(3) thin films. Characterization results showed that morphological, optical, and structural properties of Sb-2(SxSe1-x)(3) thin films grown by presented method were highly dependent on amount of sulfur in the films. By the adjustment of the S/S + Se atomic ratio, Sb-2(SxSe1-x)(3) absorber materials with suitable bandgap, favorable orientation and compact morphology can be obtained for photovoltaic applications.Article Citation - WoS: 35Citation - Scopus: 38Influence of Sulfurization Temperature on Cu2znsns4 Absorber Layer on Flexible Titanium Substrates for Thin Film Solar Cells(IOP Publishing Ltd., 2018) Buldu, Dilara Gökçen; Cantaş, Ayten; Türkoğlu, Fulya; Akça, Fatime Gülşah; Meriç, Ece; Özdemir, Mehtap; Tarhan, Enver; Özyüzer, Lütfi; Aygün, GülnurIn this study, the effect of sulfurization temperature on the morphology, composition and structure of Cu2ZnSnS4 (CZTS) thin films grown on titanium (Ti) substrates has been investigated. Since Ti foils are flexible, they were preferred as a substrate. As a result of their flexibility, they allow large area manufacturing and roll-to-roll processes. To understand the effects of sulfurization temperature on the CZTS formation on Ti foils, CZTS films fabricated with various sulfurization temperatures were investigated with several analyses including x-ray diffraction (XRD), scanning electron microscopy (SEM), x-ray photoelectron spectroscopy and Raman scattering. XRD measurements showed a sharp and intense peak coming from the (112) planes of the kesterite type lattice structure (KS), which is strong evidence for good crystallinity. The surface morphologies of our thin films were investigated using SEM. Electron dispersive spectroscopy was also used for the compositional analysis of the thin films. According to these analysis, it is observed that Ti foils were suitable as substrates for the growth of CZTS thin films with desired properties and the sulfurization temperature plays a crucial role for producing good quality CZTS thin films on Ti foil substrates.Article Citation - WoS: 2Citation - Scopus: 3Comparision of in Situ Spectroscopic Ellipsometer and Ex Situ X-Ray Photoelectron Spectroscopy Depth Profiling Analysis of Hfo2/Hf Multilayer Structure(IOP Publishing Ltd., 2018) Cantaş, Ayten; Özyüzer, Lütfi; Aygün, GülnurA HfO2 film was grown by RF magnetron sputtering technique on a Si substrate Using in situ Spectroscopic Ellipsometry (SE), the film thickness and refractive index were examined as a function of deposition time. Ex situ x-ray Photoelectron Spectroscopy (XPS) was used in depth profile mode to determine the phase evolution of HfO2/Hf/Si multilayer structure after the growth process. The chemical composition and the crystal structure of the film were investigated by Fourier Transform Infrared (FTIR) spectroscopic measurements and x-ray Diffraction in Grazing Incidence (GI-XRD) mode, respectively. The results showed that the film was grown in the form of HfO2 film. According to SE analysis, reactive deposition of HfO2 directly on Hf/Si results to SiO2 interface of about 2 nm. The final HfO2 films thickness is 5.4 nm. After a certain period of time, the XPS depth profile revealed that the film was in the form of Hf-rich Hf silicate with SiO2 interfacial layer. In reference to XPS quantification analysis from top to bottom of film, the atomic concentration of Hf element reduces from 19.35% to 7.13%, whereas Si concentration increases from 22.99% to 74.89%. The phase change of HfO2 film with time is discussed in details.Article Citation - WoS: 12Citation - Scopus: 12Ge Nanocrystals Embedded in Sio2 in Mos Based Radiation Sensors(Elsevier Ltd., 2010) Aktağ, Aliekber; Yılmaz, Ercan; Mogaddam, Nader A.P.; Aygün, Gülnur; Cantaş, Ayten; Turan, RaşitIn this work, the effects of gamma radiation on the Raman spectra of Ge nanocrystals embedded in SiO2 have been investigated. SiO2 films containing nanoparticles of Ge were grown using the r.f.-magnetron sputtering technique. Formation of Ge nanocrystals was observed after high temperature annealing in an inert atmosphere and confirmed by Raman measurements. The intensity of the Raman signal originating from Ge nanocrystals was found to decrease with increasing gamma radiation. The study also includes the gamma radiation effects on MOS structure with Ge nanocrystals embedded in SiO2. The gamma radiation effects from 500 up to 4000 Gray were investigated. Capacitance-voltage measurements were performed and analyzed. Oxide traps and interface trap charges were calculated. Results show that MOS structure with Ge nanocrystals embedded in SiO2 is a good candidate to be used in radiation sensors, especially at high radiation doses. © 2010 Elsevier B.V. All rights reserved.