Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7148
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Article Citation - WoS: 2Citation - Scopus: 2Scanning Probe Oxidation Lithography on Ta Thin Films(American Scientific Publishers, 2008) Okur, Salih; Büyükköse, Serkan; Tarı, SüleymanA Semi-Contact Scanning Probe Lithography Technique (SC-SPL) has been applied to create nano-oxide patterns on Ta thin films grown by DC magnetron sputtering method on SiO 2/Si substrates. The height and linewidth profiles of nano-oxide lines created by a conductive AFM tip on Ta film surfaces were measured as a function of applied voltage, oxidation time, humidity, and tip apex curvature. The AFM surface measurements show that the height of the oxides increases linearly with increasing voltage; but there was no oxide growth, when less than 4 V was applied even at 85% relative humidity. Electrical measurements were performed and the resistivities of the TaO x layer and Ta film were obtained as 5.76 × 10 8 and 1.4 × 10 5 Ohm-cm, respectively.Article Citation - WoS: 17Citation - Scopus: 21Humidity Sensing Properties of Chitosan by Using Quartz Crystal Microbalance Method(American Scientific Publishers, 2012) Havare, A. Kemal; İlgü, Hüseyin; Okur, Salih; Şanlı Mohamed, GülşahHumidity adsorption kinetics of chitosan films was investigated by quartz crystal microbalance (QCM) technique. In this study, chitosan was synthesized from chitin by deacetylation process in 2.0% (v/v) acetic acid solution and then coated on QCM to measure humidity response. The Langmuir model was used to determine the adsorption rates and Gibbs free energy for various relative humidity between 11% and 94%. The average Gibbs free energy for adsorption was obtained as 12.93 kJ/mol. Our reproducible experimental results show that chitosan films are very sensitive to relative humidity changes at room temperature. Copyright © 2012 American Scientific Publishers All rights reserved.Article Citation - WoS: 26Citation - Scopus: 24Effect of Ta Buffer Layer and Thickness on the Structural and Magnetic Properties of Co Thin Films(AVS Science and Technology Society, 2009) Vahaplar, Kadir; Tarı, Süleyman; Tokuç, Hüseyin; Okur, SalihSingle Co and Ta/Co bilayers were grown on Si(100) substrates in a magnetron sputtering system. The effect of Ta buffer layer and the thickness of Co layer on the structural and magnetic properties of the Co layers has been studied. A single Co layer shows a textured structure above thickness of 40 nm according to the x-ray diffraction (XRD) pattern. The magnetic properties of Co layers depend significantly on the thickness of the films. Ta grows as highly textured Β -Ta (tetragonal) phase on Si with a smooth surface. The XRD and atomic force microscopy results show that the Ta buffer layer improves the structural properties dramatically, resulting in a strongly textured and smoother surface morphology. The Ta layer also affects the magnetic properties of Co layers to a large extent, especially inducing an in-plane anisotropy in thin Co films.Conference Object Citation - WoS: 76Citation - Scopus: 80Stability of Microcrystalline Silicon for Thin Film Solar Cell Applications(Institute of Electrical Engineers, 2003) Finger, Friedhelm; Carius, Reinhard; Dylla, Thorsten; Klein, Stefan; Okur, Salih; Güneş, MehmetThe development of microcrystalline silicon (μc-Si:H) for solar cells has made good progress with efficiencies better than those of amorphous silicon (a-Si:H) devices. Of particular interest is the absence of light-induced degradation in highly crystalline μc-Si:H. However, the highest efficiencies are obtained with material which may still include a-Si:H regions and light-induced changes may be expected in such material. On the other hand, material of high crystallinity is susceptible to in-diffusion of atmospheric gases which, through adsorption or oxidation, affect the electronic transport. Investigations are presented of such effects concerning the stability of μc-Si:H films and solar cells prepared by plasma-enhanced chemical vapour deposition and hot wire chemical vapour deposition.