Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection

Permanent URI for this collectionhttps://hdl.handle.net/11147/7148

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  • Article
    Citation - WoS: 24
    Citation - Scopus: 23
    Photovoltaic Performance of Magnetron Sputtered Antimony Selenide Thin Film Solar Cells Buffered by Cadmium Sulfide and Cadmium Sulfide /Zinc Sulfide
    (Elsevier B.V., 2023) Cantas, A.; Gundogan, S.H.; Turkoglu, F.; Koseoglu, H.; Aygun, G.; Ozyuzer, L.
    Antimony selenide (Sb2Se3)-based thin-film solar cells have recently attracted worldwide attention as an abundant, low-cost, and efficient photovoltaic technology. The highest efficiencies recorded for Sb2Se3 solar cells have been obtained using cadmium sulfide (CdS) as a buffer layer. The Cd-included hybrid buffer layers could be one option to increase device efficiency through more effective usage of light. Therefore, in this work, the effect of single CdS and hybrid CdS/zinc sulfide (ZnS) buffer layers on the photovoltaic performance of Sb2Se3 thin-film solar cells has been investigated in detail. Sb2Se3 thin films have been deposited on molybdenum (Mo)-coated soda-lime glass (SLG) substrates by radio frequency magnetron sputtering technique followed by a post-heat treatment process. The morphological, and structural properties of Sb2Se3 thin films have been investigated by X-Ray Diffraction and Scanning Electron Microscopy. To compare the device performances of single CdS and hybrid CdS/ZnS buffered Sb2Se3 thin-film solar cells, SLG/Mo/Sb2Se3/CdS/ZnS/indium tin oxide (ITO) and SLG/Mo/Sb2Se3/CdS/ITO structures have been fabricated. The findings of this study have revealed a reduction in solar cells’ performance from η=3.93% for CdS buffer to η=0.13% for CdS/ZnS hybrid buffer. The change in the solar cell performance using the CdS/ZnS hybrid buffer has been discussed in detail. © 2023 Elsevier B.V.
  • Article
    Citation - WoS: 10
    Citation - Scopus: 10
    In-Situ Spectroscopic Ellipsometry and Structural Study of Hfo2 Thin Films Deposited by Radio Frequency Magnetron Sputtering
    (American Institute of Physics, 2014) Cantaş, Ayten; Özyüzer, Gülnur Aygün; Basa, Deepak Kumar
    We have investigated the reduction of unwanted interfacial SiO2 layer at HfO2/Si interface brought about by the deposition of thin Hf metal buffer layer on Si substrate prior to the deposition of HfO2 thin films for possible direct contact between HfO2 thin film and Si substrate, necessary for the future generation devices based on high-κ HfO2 gate dielectrics. Reactive rf magnetron sputtering system along with the attached in-situ spectroscopic ellipsometry (SE) was used to predeposit Hf metal buffer layer as well as to grow HfO2 thin films and also to undertake the in-situ characterization of the high-κ HfO2 thin films deposited on n-type 〈100〉 crystalline silicon substrate. The formation of the unwanted interfacial SiO2 layer and its reduction due to the predeposited Hf metal buffer layer as well as the depth profiling and also structure of HfO2 thin films were investigated by in-situ SE, Fourier Transform Infrared spectroscopy, and Grazing Incidence X-ray Diffraction. The study demonstrates that the predeposited Hf metal buffer layer has played a crucial role in eliminating the formation of unwanted interfacial layer and that the deposited high-κ HfO2 thin films are crystalline although they were deposited at room temperature.