Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7148
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Article Design of Sulfur Resistant Cobalt Catalysts by Boron Promotion: Atomic Scale Insights(Sakarya University, 2024) Kizilkaya, A.C.The effect of boron promotion on atomic sulfur formation by hydrogen sulfide dissociation on Co(111), flat surfaces of cobalt nanoparticles, was investigated using Density Functional Theory calculations. The results show that on clean Co(111), hydrogen sulfide dissociation proceeds fast due to low activation barriers, yielding atomic sulfur on the cobalt surfaces. Boron promotion hinders the dissociation of hydrogen sulfide due to increased activation barriers. Furthermore, boron prevents the interaction of sulfur compounds with cobalt surface atoms, as these poisons bind on boron. The findings indicate that boron is an effective promoter that can be used to design sulfur resistant cobalt catalysts. © 2024, Sakarya University. All rights reserved.Article Citation - WoS: 26Citation - Scopus: 24Effect of Ta Buffer Layer and Thickness on the Structural and Magnetic Properties of Co Thin Films(AVS Science and Technology Society, 2009) Vahaplar, Kadir; Tarı, Süleyman; Tokuç, Hüseyin; Okur, SalihSingle Co and Ta/Co bilayers were grown on Si(100) substrates in a magnetron sputtering system. The effect of Ta buffer layer and the thickness of Co layer on the structural and magnetic properties of the Co layers has been studied. A single Co layer shows a textured structure above thickness of 40 nm according to the x-ray diffraction (XRD) pattern. The magnetic properties of Co layers depend significantly on the thickness of the films. Ta grows as highly textured Β -Ta (tetragonal) phase on Si with a smooth surface. The XRD and atomic force microscopy results show that the Ta buffer layer improves the structural properties dramatically, resulting in a strongly textured and smoother surface morphology. The Ta layer also affects the magnetic properties of Co layers to a large extent, especially inducing an in-plane anisotropy in thin Co films.