WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7150
Browse
Search Results
Article Citation - WoS: 9Citation - Scopus: 9Simulation of 3d Inclined/Rotated Uv Lithography and Its Application To Microneedles(Urban und Fischer Verlag GmbH und Co. KG, 2012) Liu, Shijie; Aygün, Gülnur; Aygün, Gülnur; Motzek, Kristian; Evanschitzky, Peter; Erdmann, Andreas; 04.05. Department of Pyhsics; 04. Faculty of Science; 01. Izmir Institute of TechnologyA 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for chemically amplified resists and the Mack development model. As one of the interesting applications employing this promising lithography technique for MEMS fabrication, a solid microneedle for drug delivery is simulated.