WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7150
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Article Influence of Fluorine on Structural and Electrical Properties of VO2 Thin Films Deposited by Magnetron Sputtering(Elsevier Ltd, 2025) Akyurek, Bora; Cantas, Ayten; Demirhan, Yasemin; Ozyuzer, Lutfi; Aygun, GulnurThis study investigates whether fluorine-based thermal gel used during electrical measurements of vanadium oxide (VO2) films influences the structural, morphological, or compositional integrity of the films. High-quality VO2 films with a resistance ratio change of about 10(4) for metal-insulator transition were deposited by magnetron sputtering. During electrical characterization, VO2 film was heated from room temperature to similar to 370 K with a fluorine-based thermal gel usage to achieve better heat contact between the film and substrate holder. Structural and chemical properties were assessed through XRD, Raman, XPS, SEM, and energy dispersive spectroscopy imaging. XRD revealed diffraction peaks consistent with monoclinic VO2 confirming that the crystal lattice remains the same although fluorine based thermal gel was used. Raman spectra exhibited vibrational modes indicating that the phonon structure of VO2 was preserved despite fluorine gel usage. XPS results showed only a minor F 1s signal (2.8%) limited only to the film surface. SEM and EDS analyses further confirmed that surface morphology and elemental composition remained belonging to VO2 film. These findings demonstrate that the usage of fluorine-based thermal gel results in only a minimal surface interaction, thereby preserving intrinsic material properties of VO2 and supporting a potential usage for future device fabrication applications.Article Citation - WoS: 4Citation - Scopus: 4Vo<sub>2</Sub>-based Dynamic Coding Metamaterials for Terahertz Wavefront Engineering(Springer, 2025) Akyurek, Bora; Noori, Aileen; Demirhan, Yasemin; Ozyuzer, Lutfi; Guven, Kaan; Altan, Hakan; Aygun, GulnurDigital coding metasurfaces (DCMS) offer a promising alternative to conventional metasurface designs for achieving common functionalities by controlling the phase of reflected or transmitted electromagnetic waves. Their simple unit cell designs allow for scalability across the THz spectrum and facilitate large-area fabrication. The true potential of DCMS lies in dynamical coding, which enables real-time reconfigurability through a tuning and/or switching mechanism. In this study, metasurfaces that achieve 1-bit dynamic coding of unit cells via thermally induced metal-insulator transition of VO2 layers are designed and fabricated. We investigate experimentally the beam splitting functionality at certain frequencies in the 0.50-0.75 THz range reflected from the stripe- and checkerboard patterned metasurface samples, and demonstrate the switching of this functionality under thermal illumination.Article Citation - WoS: 4Citation - Scopus: 5Investigation of Resonant Properties of Metamaterial Thz Filters Fabricated From Vanadium Dioxide Thin Films(WORLD SCIENTIFIC PUBL CO PTE LTD, 2023) Zeybek, Şehriban; Demirhan, Yasemin; Noori, Aileen; Tugay, Halime; Altan, Hakan; Sabah, Cumali; Aygun, GülnurVanadium dioxide (VO2) is a promising candidate for electronic and optical switching applications in the terahertz frequency range due to the metal to insulator transition (MIT). In this study, the use of VO2 patterned as a metamaterial surface or coupled as a homogeneous layer with a metallic metamaterial surface on top is investigated in terms of performance. High-quality VO2 thin films were deposited on c-cut sapphire substrates by using the dc magnetron sputtering technique. A change in resistivity by a factor of 104 MIT in VO2 was observed allowing to investigate its use as a controllable metamaterial. The layer was patterned using a unique geometry (four-cross shaped) that operates in the THz frequency range. To understand its performance as a tunable THz filter, the four-cross structure fabricated from VO2 is compared to one fabricated from Au on VO2 bare film using UV lithography and ion beam etching techniques. The spectral performances of metamaterials were assessed using THz-Time Domain Spectroscopy (THz-TDS) and results were compared with simulations based on CST Microwave Studio. Absence of the resonant effects in the purely developed VO2 device, while clear observation of the MIT behavior shows the strong dependency of the inductive and/or capacitive effects of the four-cross structure on conductivity of the surface metamaterial, which is clearly observable for the Au-based device. In the latter case, the resonant transmittance of the filter can be effectively modulated by change in temperature.Article Citation - WoS: 3Citation - Scopus: 4Terahertz Wavefront Engineering Using a Hard-Coded Metasurface(Springer, 2023) Noori, Aileen; Akyürek, Bora; Demirhan, Yasemin; Özyüzer, Lütfi; Güven, Kaan; Altan, Hakan; Aygün, GülnurDuring the past few years, coding metamaterials (MM) drew significant attention, where the far-field scattering/transmission pattern of the electromagnetic wave (particularly in the THz regime) can be encoded into a single or few-bit digitized phase-response of the metasurface, thereby enabling a full digital control. Single-bit MMs contain two types of unit cells where the phase becomes 0 and 1 (in units of ?), respectively. By arranging these unit cells into a 2D surface pattern, the THz wavefront can be shaped. In this work, a novel hard-coded metasurface was designed, fabricated, and experimentally investigated for multi-beam reflection of incident THz beam. The design employs stripe and checkerboard patterns of bilayer MM unit cells consisting of square gold patches with a polymer spacing layer from a gold backplane. Experimental and simulation results show that the incident wave in the 0.500–0.750 THz range can be reflected with > 95% efficiency in uniform amplitude and 1-bit coded phase. For the checkerboard metasurface pattern, the measured and analytically calculated reflection angle shows good agreement. The metasurface design is suitable for large-scale fabrication and can potentially be used as a template in the development of actively coded metasurfaces. © 2023, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.Article Citation - WoS: 4Citation - Scopus: 5Enhanced Optoelectronic Properties of Magnetron Sputtered Ito/Ag Multilayers by Electro-Annealing(AVS, 2022) Uyanık, Zemzem; Türkoğlu, Fulya; Köseoğlu, Hasan; Ekmekçioğlu, Merve; Ata, Bengü; Demirhan, Yasemin; Özdemir, Mehtap; Aygün, Gülnur; Özyüzer, LütfiIndium tin oxide/silver/indium tin oxide (ITO/Ag/ITO) multilayers have attracted much attention to fulfill the growing need for high-performance transparent conducting oxide electrodes. To make these transparent multilayers work better, electro-annealing, which is a method of self-heating by electric current, can be effective. Moreover, the effect of current on ITO/Ag/ITO multilayers should be investigated to make sure that electronic devices will be reliable over their lifetime. In this study, ITO/Ag/ITO multilayer electrodes with varying Ag thicknesses were grown by DC magnetron sputtering at room temperature. Structural, optical, and electrical properties of these multilayers were investigated before and after electro-annealing. Measurement results revealed that improved optical transmittance and sheet resistance can be obtained by the optimization of Ag thickness for the as-grown ITO/Ag/ITO layers. The highest figure of merit (FoM) value of 17.37 × 10−3 Ω−1 with optical transmittance of 85.15% in the visible region and sheet resistance of 11.54 Ω/□ was obtained for the Ag thickness of 16.5 nm for as-grown samples. The electro-annealing of as-grown ITO/Ag/ITO multilayers led to improved optical behavior of the multilayer structure over a wide spectral range, especially in the near-infrared range. Electro-annealing also provided an improvement in the crystallinity and sheet resistance of the electrodes. The improvement of the electrical and optical properties of the structure enabled a FoM of 23.07 × 10−3 Ω−1 with the optical transmittance of 86.80% in the visible region and sheet resistance of 10.52 Ω/□. The findings of this work provide proper knowledge of the properties of ITO/Ag/ITO multilayers under electrical current and suggest that the overall performance of the multilayers can be improved by the electro-annealing process.Conference Object Investigation of In-Gap Field Enhancement at Terahertz Frequencies for a Metasurface Enhanced Sensor(Institute of Electrical and Electronics Engineers, 2021) Tugay, Halime; Altan, Hakan; Demirhan, Yasemin; Özyüzer, Lütfi; Sabah, CumaliThe arrangements of subwavelength inclusions in a metasurface can serve as an effective absorber for the terahertz region. When such an absorber is combined with a unique material, the absorption can induce effects that can lead to a change in the materials electrical properties. Vanadium dioxide shows a passive and reversible change from monoclinic insulator phase to metallic tetragonal rutile structure by using external stimuli such as temperature (340K), photo excitation, electric field, mechanical strain or magnetic field [1,2]. Upon absorption of the THz radiation, the high electric fields that are generated inside the gaps of the metasurface can serve as trigger points, as was shown previously using kV strength THz E-fields.Article Citation - WoS: 6Citation - Scopus: 6Nanolitography Based on Electrospun and Etched Nanofibers(Elsevier, 2021) Noori, Aileen; Döğer, Hilal; Demirhan, Yasemin; Özdemir, Mehtap; Özyüzer, Lütfi; Aygün, Gülnur; Sağlam, ÖzgeIn this study, we propose a new type of nanolithography procedure to fabricate orderly patterned metallic nanostructures using the electrohydrodynamic method and the reactive ion etching process. The electrohydrodynamic process parameters were tuned so as to create patterning with precision, and fibers in nanoscale on silver-coated substrates. We also studied reactive ion etching with different durations on the well-patterned samples. The experiments show that applying a voltage of 400 V resulted in straight patterned fibers with a diameter of 208.7 ? 30.3 nm. The statistical analysis on scanning electron microscope (SEM) images showed a significant difference in the diameter of the fibers fabricated at 400 V compared to those at 500 V and 600 V. We also confirm that the etching process has no affect on the fiber diameter. Moreover, electron dispersive X-Ray spectrometer (EDX) results suggest that an etching duration of 7 min is sufficient to remove the silver coating that is not covered with the fibers, and protect the silver nanostructures underneath the fibers. Utilizing a lowcost nanolithography procedure, we obtain the orderly patterned silver nanostructures for possible integration into miniaturized devices.Article Citation - WoS: 2Citation - Scopus: 2In-Situ Thin Film Copper-Copper Thermocompression Bonding for Quantum Cascade Lasers(Springer, 2021) Rouhi, Sina; Özdemir, Mehtap; Ekmekçioğlu, Merve; Yiğen, Serap; Demirhan, Yasemin; Szerling, Anna; Kosiel, Kamil; Kozubal, Maciej; Kruszka, Renata; Prokaryn, Piotr; Ertuğrul, Mehmet; Reno, John L.; Aygün, Gülnur; Özyüzer, LütfiThe choice of metals, bonding conditions and interface purity are critical parameters for the performance of metal-metal bonding quality for quantum cascade lasers (QCLs). Here, we present a novel approach for the thermocompression bonding of Cu-Cu thin films on GaAs-based waveguides without having any oxide phase, contamination or impurities at the interface. We designed a hybrid system in which magnetron sputtering of Ta, thermal evaporation of Cu and Cu-Cu thermocompression bonding processes can be performed sequentially under high vacuum conditions. GaAs/Ta/Cu and Cu/Ta/GaAs structures were thermocompressionally bonded in our in-situ homebuilt bonding system by optimizing the deposition parameters and bonding conditions. The grown thin film and the obtained interfaces were characterized using x-ray diffraction (XRD), scanning electron microscopy (SEM) and energy-dispersive x-ray spectroscopy (EDX) techniques. The optimum Ta and Cu films' thicknesses were found to be about 20 nm and 500 nm, respectively. EDX analysis showed that the Ta thin film interlayer diffused into the Cu structure, providing better adhesivity and rigidity for the bonding. Additionally, no oxidation phases were detected at the interface. The best bonding quality was obtained when heated up to 430 degrees C with an applied pressure of 40 MPa during bonding process.Conference Object Spin Polarized Tunneling in Large Area Mesas of Superconducting Bi 2sr2cacu2o8+δ for the Generation of the Thz Waves(Institute of Electrical and Electronics Engineers Inc., 2009) Türkoğlu, Fulya; Şimşek, Yılmaz; Köseoğlu, Hasan; Demirhan, Yasemin; Meriç Polster, Zeynep; Özyüzer, LütfiRectangular intrinsic Josephson junction mesa structures of superconducting Bi2Sr2CaCu2O8+delta (Bi2212) can be used as a source of continuous, coherent and polarized terahertz (THz) radiation. THz emitting mesas are below a certain underdoped level of Bi2212. They have small Josephson critical current in contrast to optimally doped and overdoped Bi2212. We deposited Au/Co/Au multilayer top of mesa and obtained small critical current from mesas fabricated by as-grown Bi2212 single crystals due to injection of spin polarized current. The spin injection eliminates adjustment of doping level for successful THz emission.Conference Object Reactive Ion Beam Etching of Superconducting Bi2212 by Ta/Pr and Pr'/ta/pr Masks for the Generation of Thz Waves(Institute of Electrical and Electronics Engineers Inc., 2009) Köseoğlu, Hasan; Türkoğlu, Fulya; Demirhan, Yasemin; Meriç Polster, Zeynep; Özyüzer, LütfiGeneration of powerful THz radiation from intrinsic Josephson Junctions (Ills) of Bi(2)Sr(2)CaCu(2)O(8+delta) (Bi2212) may require mesas with large lateral dimension. However, there are difficulties in fabrication of perfect rectangular mesas. Mesa lateral angles should be close to 90 degrees to obtain IJJs with same planar dimensions for synchronization of IJJs. Since thick photoresist (PR) layer shades the lateral dimension of mesa during ion beam etching, we patterned Ta/PR and PR'/Ta/PR masks on Bi2212 and used selective ion etching to overcome this problem. The reactive ion beam etchings have done with ion beam of Ar, N(2) and O(2) and we have obtained mesas about 1 mu m with lateral angle of approximately 50 to 75 degrees which is better than the mesas fabricated with single layer mask.
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