WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7150
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Article Citation - WoS: 12Citation - Scopus: 15Local Oxidation Nanolithography on Hf Thin Films Using Atomic Force Microscopy (afm)(IOP Publishing Ltd., 2009) Büyükköse, Serkan; Okur, Salih; Özyüzer, Gülnur AygünWell controlled Hf oxide patterns have been grown on a flat Hf thin film surface produced by the dc magnetron sputtering method on Si and SiOx substrates. These patterns have been created by using the technique of semi-contact scanning probe lithography (SC-SPL). The thickness and width of the oxide patterns have been measured as a function of applied voltage, duration and relative humidity. There is a threshold voltage even at 87% humidity, due to insufficient energy required to start the oxide growth process for a measurable oxide protrusion. Electrical characterization was also performed via the I-V curves of Hf and HfOx structures, and the resistivity of HfO x was found to be 4.284 × 109 Ω cm. In addition to the I-V curves, electric force microscopy and spreading surface resistance images of Hf and HfOx were obtained.Article Citation - WoS: 3Citation - Scopus: 3Mgb2 Superconducting Thin Films Grown by Magnetron Sputtering(National Institute of Optoelectronics, 2007) Ulucan, Savaş; Özyüzer, Lütfi; Okur, SalihIn this study, we report the growth and properties of MgB2 thin films on polycrystalline Al2O3 substrates. A composite MgB2 target was produced by MgB2 and Mg powder mixing, using a hot pressing technique. MgB2 thin films were grown on Al 2O3 substrates by d.c. magnetron sputtering, without heating the substrate. To enhance the superconducting properties of the as-grown films and to increase the crystal quality, an ex-situ anneal process was applied. The crystal structure of the thin films was determined by X-ray diffraction. The resistivity versus temperature of the deposited MgB2 thin films was studied to examine the transition temperatures of the films under various magnetic fields. The effects of the annealing temperature and annealing time on the electrical properties of MgB2 thin films are revealed.Article Citation - WoS: 25Citation - Scopus: 26Structural and Optical Characteristics of Tantalum Oxide Grown by Pulsed Nd:yag Laser Oxidation(AVS Science and Technology Society, 2006) Atanassova, Elenada A.; Aygün, Gülnur; Turan, Raşit; Babeva, T.Tantalum pentoxide (Ta2 O5) thin films (20-50 nm) have been grown by 1064 nm Nd:YAG laser oxidation of Ta film deposited on Si. The chemical bonding, structure, and optical properties of the films have been studied by Fourier transform infrared spectroscopy, x-ray diffraction, and reflectance measurements at normal light incidence in the spectral range of 350-800 nm. The effect of the substrate temperature (250-400 °C) during oxidation and its optimization with respect to the used laser beam energy density (3.2-3.4 J cm2 per pulse) is discussed. It is established that the substrate temperature is a critical factor for the effectiveness of the oxidation process and can be used to control the composition and amorphous status of the films. The film density explored by refractive index is improved with increasing film thickness. The refractive index of the layers grown under the higher laser beam energy density and at substrate temperature of 350-400 °C was found to be close to the value of bulk Ta2 O5. The films are amorphous at substrate temperature below 350 °C and possessed an orthorhombic (Β- Ta2 O5) crystal structure at higher temperatures. The thinner layers crystallize at a little higher temperature.Conference Object Citation - WoS: 6Citation - Scopus: 9Sub-Bandgap Optical Absorption Spectroscopy of Hydrogenated Microcrystalline Silicon Thin Films Prepared Using Hot-Wire Cvd (cat-Cvd) Process(Elsevier Ltd., 2006) Göktaş, Oktay; Işık, Nebile; Okur, Salih; Güneş, Mehmet; Carius, Reinhard; Klomfaß, Josef; Finger, FriedhelmHydrogenated microcrystalline silicon (μc-Si:H) thin films with different silane concentration (SC) have been prepared using the HW-CVD technique. Dual beam photoconductivity (DBP), photothermal deflection spectroscopy (PDS), and transmission measurements have been used to investigate the optical properties of the μc-Si:H films. Two different sub-bandgap absorption, α(hν), methods have been applied and analyzed to obtain a better insight into the electronic states involved. A good agreement has been obtained in the absorption spectrum obtained from the PDS and DBP measurements at energies above the bandgap. Differences between PDS and DBP spectra exist below the bandgap energy where DBP spectra always give lower α(hν) values and show a dependence on the SC. For some films, differences exist in the α(hν) spectra when the DBP measurements are carried out through the film and substrate side. In addition, for some films, there remains fringe pattern left on the spectrum after the calculation of the fringe-free absorption spectrum, which indicates structural inhomogeneities present throughout the film.Conference Object Citation - WoS: 8Citation - Scopus: 9Diffusion Length Measurements of Microcrystalline Silicon Thin Films Prepared by Hot-wire/Catalytic Chemical Vapor Deposition (hwcvd)(Elsevier Ltd., 2006) Okur, Salih; Güneş, Mehmet; Finger, Friedhelm; Carius, ReinhardHydrogenated microcrystalline silicon (μc-Si:H) films prepared by using the hot-wire/catalytic chemical vapor deposition (HWCVD) technique at low substrate temperatures between 185 °C and 220 °C with different silane concentrations (SC) were investigated using steady-state photocarrier grating (SSPG) and the steady-state photoconductivity methods (SSPC). Crystalline volume fractions (IC RS) obtained from Raman spectroscopy change from 0.22 to 0.77. The diffusion length (LD) is measured at generation rates between G = 1019 and 1021 cm- 3 s- 1. LD changes from 27 nm to 270 nm, with maximum values around SC = 5%. The dependence of LD on SC is similar to that observed for similar quality microcrystalline silicon films prepared using the VHF-PECVD technique. The grating quality factor, γ0, drops from about 0.9 to 0.5 after transition to the microcrystalline regime as indication of scattering from surface patterns.Article Citation - WoS: 51Citation - Scopus: 57Characterization of Waterborne Acrylic Based Paint Films and Measurement of Their Water Vapor Permeabilities(Elsevier, 2006) Topçuoğlu, Özge; Alsoy Altınkaya, Sacide; Balköse, DevrimRecently, production of waterborne coatings has increased significantly as a consequence of strict pollution regulations. Waterborne coatings are sensitive to humidity, thus, their barrier properties with respect to permeation of moisture needs to be determined. Among various coating constituents, binder represents the matrix structure and its amount relative to the amounts of pigments and fillers can significantly affect the structure, hence the barrier property of the coating. In this study, waterborne acrylic based paints applied as protective coating on interior and exterior wall of the buildings are studied. The paint samples formulated with four different binder contents by a commercial paint company are used in the experiments. We first determine unknown ingredients of the paint samples using different characterization tools and then investigate the effect of the binder content on the structure of the paint films. In addition, water vapor permeability of the paint films is measured using a permeation cell. Results show that the barrier property of the waterborne acrylic based paint films against humidity decreases with decreased binder content due to uneven distribution of the pigments, consequently, porous structure formation in the films.Article Citation - WoS: 10Citation - Scopus: 12The Superconducting Transition Width and Illumination Wavelength Dependence of the Response of Mgo Substrate Ybco Transition Edge Bolometers(Elsevier Ltd., 2007) Öktem, B.; Bozbey, Ali; Avcı, İlbeyi; Tepe, Mustafa; Abukay, Doğan; Fardmanesh, M.Dependence of the phase and magnitude of the response of MgO substrate YBa2Cu3O7-δ (YBCO) transition edge bolometers to the near infrared radiation on the superconducting transition width is presented in this work. The bolometers were made of YBCO thin films of 200 nm thickness that were grown on single crystal MgO (1 0 0) substrates by DC inverted cylindrical magnetron sputtering. We have measured the responses of both large and small area devices with respect to the bias temperature and radiation modulation frequency. We have observed that the superconducting transition width has major effects on the response of the bolometers such as; on a dip of the phase of the response versus modulation frequency curve around 1 Hz, the rate of decrease of the magnitude of the response, and dependence of the phase of the response on temperature at mid-range modulation frequency. We have investigated a correlation between the superconducting transition width and the YBCO film surface morphology of the devices. In addition, the illumination wavelength dependence of the optical response of both wide and narrow transition width devices has been investigated. Here we present the analysis and the possible mechanisms that can affect the response of the bolometers at the superconducting transition region.Article Citation - WoS: 13Citation - Scopus: 12Mgb2 Superconducting Thin Films Sequentially Fabricated Using Dc Magnetron Sputtering and Thermionic Vacuum Arc Method(Elsevier Ltd., 2007) Okur, Salih; Kalkancı, M.; Pat, Suat; Ekem, Naci; Akan, Tamer; Balbağ, Zafer; Musa, G.; Tanoğlu, MetinIn this work, we discuss fabrication and characterization of MgB2 thin films obtained by sequential deposition and annealing of sandwich like Mg/B/Mg thin films on glass substrates. Mg and B films were prepared using DC magnetron sputtering and thermionic vacuum arc techniques, respectively. The MgB2 thin films showed superconducting critical transition at 33 K after annealing at 650 °C.Conference Object Citation - WoS: 7Citation - Scopus: 10Sub-Bandgap Absorption Spectroscopy and Minority Carrier Transport Properties of Hydrogenated Microcrystalline Silicon Thin Films(National Institute of Optoelectronics, 2005) Güneş, Mehmet; Göktaş, Oktay; Okur, Salih; Işık, Nebile; Carius, Reinhard; Klomfaß, Josef; Finger, FriedhelmHydrogenated microcrystalline silicon thin films have been prepared using HW-CVD and VHF-PECVD techniques with different silane concentrations. The steady-state photoconductivity, dual beam photoconductivity, photothermal deflection spectroscopy and steady-state photocarrier grating (SSPG) methods have been used to investigate the optical and electronic properties of the films. Two different sub-bandgap absorption methods have been applied and analyzed to obtain a better insight into the electronic states involved. For some films, differences existed in the optical absorption spectra when the measurements were carried out through the film side and through the substrate side. In addition, for some films, fringe patterns remained on the spectrum after the calculation of the fringe free absorption spectrum, which indicates that structural inhomogeneities were present throughout the film. Finally, minority carrier diffusion lengths deduced from the SSPG measurements were investigated as a function of the crystalline volume fraction (I c RS) obtained from Raman spectroscopy. The longest diffusion lengths and lowest sub-bandgap absorption coefficients were obtained for films deposited in the region of the transition to the amorphous growth.Article Citation - WoS: 13Citation - Scopus: 14Electronic Transport Properties of Microcrystalline Silicon Thin Films Prepared by Vhf-Pecvd(Springer Verlag, 2004) Okur, Salih; Güneş, Mehmet; Göktaş, Oktay; Finger, Friedhelm; Carius, ReinhardSteady-state photocarrier grating (SSPG) and steady-state photoconductivity, σph, experiments have been carried out to investigate the electronic transport properties of undoped hydrogenated microcrystalline silicon (μc-Si: H) films prepared with very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD). Material with different crystalline volume fractions was obtained by variation of the silane concentration (SC) in the process gas mixture. Pure amorphous silicon material was investigated for comparison. The ambipolar diffusion length, L amb, which is dominated by the minority carrier properties, is obtained both from the best fit to the experimental photocurrents ratio, β, versus grating period (Λ), and from the "Balberg plot" for the generation rates between 1019 and 1021 cm -3 s-1. Lamb increases from 86 nm with increasing SC and peaks around 200 nm for the SC = 5.6% and decreases again for higher SCs. Lamb values obtained from the intercept of the Balberg plot result in a small difference of around 5% for most of the samples. Minority carrier mobility-lifetime (μτ)-products are much lower than those of majority carriers, however, both majority and minority carrier μτ-products in microcrystalline silicon are higher than those of undoped hydrogenated amorphous silicon. The grating quality factor (γ 0) changes from 0.70 to 1.0 indicating almost negligible surface roughness present in the samples.