Bilgilisoy, Elif
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01. Izmir Institute of Technology
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Scholarly Output
6
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4
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4760/3287
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WoS Citation Count
23
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24
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3.83
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4.00
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6
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1
| Journal | Count |
|---|---|
| Journal of Electronic Materials | 3 |
| AIP Advances | 1 |
| Journal of Applied Physics | 1 |
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Article Citation - WoS: 4Citation - Scopus: 5Identifying Threading Dislocations in Cdte Films by Reciprocal Space Mapping and Defect Decoration Etching(American Institute of Physics, 2018) Polat, Mustafa; Bilgilisoy, Elif; Arı, Ozan; Öztürk, Orhan; Selamet, YusufWe study threading dislocation (TD) density of high-quality cadmium telluride (CdTe) layers grown on a (211) oriented GaAs substrate by molecular beam epitaxy. High-resolution X-ray diffraction was performed to calculate the density of screw-type TDs by measuring the broadening of the asymmetrical (511) Bragg reflections of CdTe epilayers. In addition, total TD densities were determined by the Everson-etching method and were compared with screw TDs. Our results show that the total TD densities in CdTe films were dominated by those with screw character. The screw component TDs are estimated to account for more than 90% of the total TD density. CdTe layers grown at a thickness of less than 3.0 μm typically exhibit the screw TD densities in the 106 cm-2 and 107 cm-2 range. It can be noted that as the nucleation temperature increases, i.e., ≥222 °C, both the area density of TDs with the screw component of the CdTe films and the total TD density are roughly four times larger than those of the epilayer grown at the nucleation temperature of 215 °C. Furthermore, we discuss the influence of the II/VI flux ratio on the density of threading dislocations. The contribution of screw TDs to the total TD density showed a significant decrease in roughly 30% in the case of a high II/VI flux ratio. We further examine the reciprocal space maps in the vicinity of the (422) reflections.Article Citation - WoS: 2Citation - Scopus: 2Surface Roughness Estimation of Mbe Grown Cdte/Gaas(211)b by Ex-Situ Spectroscopic Ellipsometry(American Institute of Physics, 2016) Karakaya, Merve; Bilgilisoy, Elif; Arı, Ozan; Selamet, YusufSpectroscopic ellipsometry (SE) ranging from 1.24 eV to 5.05 eV is used to obtain the film thickness and optical properties of high index (211) CdTe films. A three-layer optical model (oxide/CdTe/GaAs) was chosen for the ex-situ ellipsometric data analysis. Surface roughness cannot be determined by the optical model if oxide is included. We show that roughness can be accurately estimated, without any optical model, by utilizing the correlation between SE data (namely the imaginary part of the dielectric function, <ϵ2 > or phase angle, ψ) and atomic force microscopy (AFM) roughness. <ϵ2 > and ψ values at 3.31 eV, which corresponds to E1 critical transition energy of CdTe band structure, are chosen for the correlation since E1 gives higher resolution than the other critical transition energies. On the other hand, due to the anisotropic characteristic of (211) oriented CdTe surfaces, SE data (<ϵ2 > and ψ) shows varieties for different azimuthal angle measurements. For this reason, in order to estimate the surface roughness by considering these correlations, it is shown that SE measurements need to be taken at the same surface azimuthal angle. Estimating surface roughness in this manner is an accurate way to eliminate cumbersome surface roughness measurement by AFM.Article Citation - WoS: 11Citation - Scopus: 12Characterization of Cdte Growth on Gaas Using Different Etching Techniques(Springer Verlag, 2015) Bilgilisoy, Elif; Özden, Selin; Bakali, Emine; Karakaya, Merve; Selamet, YusufCdTe buffer layers which were grown on (211)B GaAs by molecular beam epitaxy were subjected to two different etch treatments to quantify the crystal quality and dislocation density. The optical properties and thicknesses of the samples were obtained by ex situ spectroscopic ellipsometry. The surface morphologies of the CdTe epilayers were analyzed by atomic force microscopy, scanning electron microscopy, and Nomarski microscopy before and after chemical etching. We compare the triangle- and trapezoid-shaped etch pits due to the Everson and Nakagawa etch solutions, respectively. Measured etch pit density (EPD) values of triangle etch pits were found in the 8 × 107 cm−2 to 2 × 108 cm−2 range, and trapezoid-shaped etch pits were found in the 1 × 107 cm−2 to 7 × 107 cm−2 range for samples with thicknesses <2 μm.Other Erratum To: Mbe-Grown Cdte Layers on Gaas With In-Assisted Thermal Deoxidation(Springer Verlag, 2016) Arı, Ozan; Bilgilisoy, Elif; Özçeri, Elif; Selamet, YusufArticle Citation - WoS: 6Citation - Scopus: 5Mbe-Grown Cdte Layers on Gaas With In-Assisted Thermal Deoxidation(Springer Verlag, 2016) Arı, Ozan; Bilgilisoy, Elif; Özçeri, Elif; Selamet, YusufMolecular beam epitaxy (MBE) growth of thin (∼2 μm) CdTe layers characterized by high crystal quality and low defect density on lattice mismatched substrates, such as GaAs and Si, has thus far been difficult to achieve. In this work, we report the effects of in situ thermal deoxidation under In and As4 overpressure prior to the CdTe growth on epiready GaAs(211)B wafers, aiming to enhance CdTe crystal quality. Thermally deoxidized GaAs samples were analyzed using in situ reflection high energy electron diffraction, along with ex situ x-ray photo-electron spectroscopy (XPS) and atomic force microscopy. MBE-grown CdTe layers were characterized using x-ray diffraction (XRD) and Everson-type wet chemical defect decoration etching. We found that In-assisted desorption allowed for easier surface preparation and resulted in a smoother surface compared to As-assisted surface preparation. By applying In-assisted thermal deoxidation to GaAs substrates prior to the CdTe growth, we have obtained single crystal CdTe films with a CdTe(422) XRD rocking curve with a full-width half-maximum value of 130.8 arc-s and etch pit density of 4 × 106 cm−2 for 2.54 μm thickness. We confirmed, by XPS analysis, no In contamination on the thermally deoxidized surface.Master Thesis Characterization of Lattice Mismatch Induced Dislocations on Epitaxial Cdte Films(Izmir Institute of Technology, 2015) Bilgilisoy, Elif; Selamet, YusufMercury Cadmium Telluride (HgCdTe) is a widely used material for infrared focal plane array applications. In order to produce high quality infrared detecting material, HgCdTe needs to be grown on large area alternative substrates such as GaAs, GaSb, Si or Ge. GaAs is the best choice as an alternative substrate due to its surface polarity and commercially availability of high quality epi-ready wafers. However, there exists a lattice mismatch between HgCdTe and GaAs. To minimize the detrimental effect of the large lattice mismatch between the two materials, Cadmium Telluride (CdTe) is preferred as a buffer layer for HgCdTe IR material. The lattice mismatch between HgCdTe/CdTe and the GaAs substrate results in a large number of misfit dislocations. Dislocation density of the buffer layer limits and reduces the detector device performance. For this reason, the crystal quality and dislocation analysis of CdTe are examined in detail to produce large area and high performance HgCdTe IR devices. The aim of this thesis is the characterization of lattice mismatch induced dislocations on epitaxial CdTe buffer layers. CdTe epilayers which were grown on (211)B GaAs by molecular beam epitaxy (MBE) were subjected to two different etch treatments to quantify the crystal quality and dislocation density. The crystal quality was also obtained by using x-ray diffraction (XRD) measurements. The thicknesses of the samples were measured by ex-situ spectroscopic ellipsometry (SE). The surface morphologies of the CdTe buffer layers were analyzed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Nomarski microscopy before and after wet chemical etching. Vibrational phonon modes distributions of the as-grown and etched samples were examined by Raman spectroscopy mapping. The “triangle” and “trapezoid” shaped etch pits were compared due to the Everson and Nakagawa etching solutions, respectively. Measured etch pit density (EPD) values of “triangle” etch pits were found in 0.3x108 – 3.8x108 cm-2 range and “trapezoid” shaped etch pits were found in 0.03x108 – 0.6x108 cm-2 range for samples.