Conductance Fluctuations in A-Si:h: Effects of Alloying and Device Structure

dc.contributor.author Kasap, Safa O.
dc.contributor.author Güneş, Mehmet
dc.contributor.author Johanson, Robert E.
dc.contributor.author Wang, Q.
dc.contributor.author Yang, Jeffrey
dc.contributor.author Guha, Subhendu
dc.coverage.doi 10.1023/A:1026127020267
dc.date.accessioned 2016-05-27T11:53:26Z
dc.date.available 2016-05-27T11:53:26Z
dc.date.issued 2003
dc.description.abstract We present measurements of conductance noise in undoped a-Si:H and a-SiGe: H thin films in both a transverse and coplanar electrode geometry. For a-Si:H with coplanar electrodes, the noise spectrum is not a pure f-α power law but consists of two linear regions with different slope parameters α. The spectral shape and its temperature dependence are similar for all samples, regardless of the growth technique. Adding Ge results in qualitatively similar spectra; however, α at high frequencies and the temperature dependence are altered. For both a-Si:H and a-SiGe:H with transverse electrodes, the noise spectra are pure f-α power laws, and α decreases with the Ge content. en_US
dc.description.sponsorship NSERC en_US
dc.identifier.citation Kasap, S. O., Güneş, M., Johanson, R. E., Wang, Q., Yang, J., and Guha, S. (2003). Conductance fluctuations in a-Si:H: Effects of alloying and device structure. Journal of Materials Science: Materials in Electronics, 14(10-12), 693-696. doi:10.1023/A:1026127020267 en_US
dc.identifier.doi 10.1023/A:1026127020267
dc.identifier.doi 10.1023/A:1026127020267 en_US
dc.identifier.issn 0957-4522
dc.identifier.issn 0957-4522
dc.identifier.scopus 2-s2.0-0242380245
dc.identifier.uri http://doi.org/10.1023/A:1026127020267
dc.identifier.uri https://hdl.handle.net/11147/4673
dc.language.iso en en_US
dc.publisher Springer Verlag en_US
dc.relation.ispartof Journal of Materials Science: Materials in Electronics en_US
dc.rights info:eu-repo/semantics/openAccess en_US
dc.subject Silanes en_US
dc.subject Conductance noises en_US
dc.subject Alloying en_US
dc.subject Electrodes en_US
dc.subject Plasma enhanced chemical vapor deposition en_US
dc.title Conductance Fluctuations in A-Si:h: Effects of Alloying and Device Structure en_US
dc.type Conference Object en_US
dspace.entity.type Publication
gdc.author.institutional Güneş, Mehmet
gdc.bip.impulseclass C5
gdc.bip.influenceclass C5
gdc.bip.popularityclass C5
gdc.coar.access open access
gdc.coar.type text::conference output
gdc.collaboration.industrial false
gdc.description.department İzmir Institute of Technology. Physics en_US
gdc.description.endpage 696 en_US
gdc.description.issue 10-12 en_US
gdc.description.publicationcategory Konferans Öğesi - Uluslararası - Kurum Öğretim Elemanı en_US
gdc.description.scopusquality Q2
gdc.description.startpage 693 en_US
gdc.description.volume 14 en_US
gdc.description.wosquality Q2
gdc.identifier.openalex W59790544
gdc.identifier.wos WOS:000185962400022
gdc.index.type WoS
gdc.index.type Scopus
gdc.oaire.diamondjournal false
gdc.oaire.impulse 0.0
gdc.oaire.influence 2.635068E-9
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gdc.oaire.keywords Plasma enhanced chemical vapor deposition
gdc.oaire.keywords Conductance noises
gdc.oaire.keywords Silanes
gdc.oaire.keywords Electrodes
gdc.oaire.keywords Alloying
gdc.oaire.popularity 3.0782712E-10
gdc.oaire.publicfunded false
gdc.openalex.collaboration International
gdc.openalex.fwci 0.31343167
gdc.openalex.normalizedpercentile 0.57
gdc.opencitations.count 2
gdc.plumx.crossrefcites 2
gdc.plumx.mendeley 10
gdc.plumx.scopuscites 2
gdc.scopus.citedcount 2
gdc.wos.citedcount 1
local.message.claim 2022-06-16T11:18:52.542+0300 *
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local.message.claim |submit_approve *
local.message.claim |dc_contributor_author *
local.message.claim |None *
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