Simulation of 3d Inclined/Rotated Uv Lithography and Its Application To Microneedles
| dc.contributor.author | Liu, Shijie | |
| dc.contributor.author | Roeder, George | |
| dc.contributor.author | Aygün, Gülnur | |
| dc.contributor.author | Motzek, Kristian | |
| dc.contributor.author | Evanschitzky, Peter | |
| dc.contributor.author | Erdmann, Andreas | |
| dc.coverage.doi | 10.1016/j.ijleo.2011.07.007 | |
| dc.date.accessioned | 2017-04-10T09:05:23Z | |
| dc.date.available | 2017-04-10T09:05:23Z | |
| dc.date.issued | 2012 | |
| dc.description.abstract | A 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for chemically amplified resists and the Mack development model. As one of the interesting applications employing this promising lithography technique for MEMS fabrication, a solid microneedle for drug delivery is simulated. | en_US |
| dc.description.sponsorship | Bayerische Forschungsstiftung | en_US |
| dc.identifier.citation | Liu, S., Roeder, G., Aygün, G., Motzek, K., Evanschitzky, P. and Erdmann, A. (2012). Simulation of 3D inclined/rotated UV lithography and its application to microneedles. Optik, 123(10), 928-931. doi:10.1016/j.ijleo.2011.07.007 | en_US |
| dc.identifier.doi | 10.1016/j.ijleo.2011.07.007 | en_US |
| dc.identifier.doi | 10.1016/j.ijleo.2011.07.007 | |
| dc.identifier.issn | 0030-4026 | |
| dc.identifier.issn | 1618-1336 | |
| dc.identifier.issn | 0030-4026 | |
| dc.identifier.scopus | 2-s2.0-84859525747 | |
| dc.identifier.uri | http://dx.doi.org/10.1016/j.ijleo.2011.07.007 | |
| dc.identifier.uri | https://hdl.handle.net/11147/5272 | |
| dc.language.iso | en | en_US |
| dc.publisher | Urban und Fischer Verlag GmbH und Co. KG | en_US |
| dc.relation.ispartof | Optik | en_US |
| dc.rights | info:eu-repo/semantics/openAccess | en_US |
| dc.subject | 3D simulation | en_US |
| dc.subject | Inclined and rotated exposure | en_US |
| dc.subject | Microneedles | en_US |
| dc.subject | UV lithography | en_US |
| dc.subject | Three dimensional computer graphics | en_US |
| dc.title | Simulation of 3d Inclined/Rotated Uv Lithography and Its Application To Microneedles | en_US |
| dc.type | Article | en_US |
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| gdc.author.institutional | Aygün, Gülnur | |
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| gdc.description.department | İzmir Institute of Technology. Physics | en_US |
| gdc.description.endpage | 931 | en_US |
| gdc.description.issue | 10 | en_US |
| gdc.description.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
| gdc.description.scopusquality | Q1 | |
| gdc.description.startpage | 928 | en_US |
| gdc.description.volume | 123 | en_US |
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| gdc.oaire.keywords | UV lithography | |
| gdc.oaire.keywords | Inclined and rotated exposure | |
| gdc.oaire.keywords | Three dimensional computer graphics | |
| gdc.oaire.keywords | 3D simulation | |
| gdc.oaire.keywords | Microneedles | |
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