Physics / Fizik
Permanent URI for this collectionhttps://hdl.handle.net/11147/6
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Article Citation - WoS: 35Citation - Scopus: 35Cvd Graphene/Sic Uv Photodetector With Enhanced Spectral Responsivity and Response Speed(Elsevier, 2023) Jehad, Ala K.; Fidan, Mehmet; Ünverdi, Özhan; Çelebi, CemA self-powered, high-performance graphene/Silicon Carbide (G/4H-SiC) ultraviolet Schottky junction photodetector has been fabricated, and the effect of using monolayer and bilayer graphene on the device performance parameters was investigated. P-type graphene sheets were grown by the chemical vapor deposition (CVD) method, while 4H-SiC material consists of an epilayer structure of n-/n+ on bulk n-SiC. Two photodetector devices have been studied, one with monolayer graphene (MLG) and the other with bilayer graphene (BLG). The proposed photodetector structure reveals the highest spectral responsivity known of a G/4H-SiC UV photodetector so far. Electronic and optoelectronic characterizations were done under an ultraviolet wavelength range from 240 to 350 nm. The results show two spectral responsivity maxima (Rmax) at 285 nm and 300 nm wavelengths. Exhibiting two maxima in spectral responsivity and detectivity is caused by the constructive and destructive interference effects of multiple reflections at the SiC epilayer's interfaces. The photodetector devices exhibit high spectral responsivity (R ? 0.09 AW?1), maximum detectivity (D* ? 2.9 × 1012 Jones), and minimum noise equivalent power (NEP ? 0.17 pWHz-1/2) in both devices. Using bilayer graphene instead of monolayer showed no significant change in both the photogenerated current and the spectral responsivity due to the higher absorption coefficient of bilayer graphene, however, it exhibited a significant improvement in the response speed. The response speed was found to increase by 50 % when bilayer graphene was used as a hole collecting electrode in the G/4H-SiC junction. This is because bilayer graphene creates a narrower depletion layer and higher electric field, which promotes efficient charge separation and recombination. © 2023 Elsevier B.V.Article Citation - WoS: 22Citation - Scopus: 26Flexible Metal/Semiconductor Type Photodetectors Based on Manganese Doped Zno Nanorods(Elsevier, 2023) Karagöz, Emine; Altaf, Çiğdem Tuç; Yaman, Ecenaz; Yıldırım, İpek Deniz; Erdem, Emre; Çelebi, Cem; Fidan, Mehmet; Sankir, Mehmet; Demirci Sankir, NurdanHigh-performance flexible photodetectors are one of the most interesting research areas due to their great possibilities for a variety of applications such as portable and wearable optoelectronics. This study verifies the performance of flexible metal/semiconductor/metal-type photodetector based on pristine and manganese doped ZnO nanorods (ZnO-NRs) prepared in two different concentrations of zinc precursors and manganese dopant at low temperatures. The photodetectors having ZnO-NRs with high aspect ratios were investigated by various material characterization techniques such as electron paramagnetic resonance and photoluminescence spectroscopy to confirm the relationship between defect concentrations and photodetector performance parameters. It has been calculated that the detectivity (D*) and responsivity (R) of the ZnO nanorod-based photodetectors increased 20 and 18 folds, respectively by increasing the concentration of zinc precursor. Besides the D* and R values of the photodetectors, prepared by the 16.5 mM zinc precursor, increased 18 and 4.5-fold, respectively, after manganese doping. We confirmed that even a very low concentration of zinc precursor could produce a photodetector with high performance in photo-response characteristics, flexibility, and stability against 10,000 cycles of convex/concave bending.(c) 2023 Elsevier B.V. All rights reserved.Article Citation - WoS: 4Citation - Scopus: 4Graphene/Soi-based Self-Powered Schottky Barrier Photodiode Array(American Institute of Physics, 2022) Yanılmaz, Alper; Fidan, Mehmet; Ünverdi, Özhan; Çelebi, CemWe have fabricated a four-element graphene/silicon on insulator (SOI) based Schottky barrier photodiode array (PDA) and investigated its optoelectronic device performance. In our device design, monolayer graphene is utilized as a common electrode on a lithographically defined linear array of n-type Si channels on a SOI substrate. As revealed by wavelength resolved photocurrent spectroscopy measurements, each element in the PDA structure exhibited a maximum spectral responsivity of around 0.1 A/W under a self-powered operational mode. Time-dependent photocurrent spectroscopy measurements showed excellent photocurrent reversibility of the device with ∼1.36 and ∼1.27 μs rise time and fall time, respectively. Each element in the array displayed an average specific detectivity of around 1.3 × 1012 Jones and a substantially small noise equivalent power of ∼0.14 pW/Hz-1/2. The study presented here is expected to offer exciting opportunities in terms of high value-added graphene/Si based PDA device applications such as multi-wavelength light measurement, level metering, high-speed photometry, and position/motion detection.Article Citation - WoS: 2Citation - Scopus: 2Enhancing the Photo-Response Characteristics of Graphene/N-si Based Schottky Barrier Photodiodes by Increasing the Number of Graphene Layers(AVS, 2022) Fidan, Mehmet; Ünverdi, Özhan; Çelebi, CemThe impact of the number of graphene layers on the spectral responsivity and response speed of graphene/n-type Si (Gr/n-Si)-based Schottky barrier photodiodes is investigated. Gr/n-Si photodiode devices are fabricated by transferring chemical vapor deposition-grown graphene layers one by one on n-Si substrates, reaching up to three graphene layers. The devices show a clear rectifying Schottky character and have a maximum responsivity at a peak wavelength of 905 nm. Wavelength-resolved and time-dependent photocurrent measurements demonstrated that both spectral responsivity and response speed are enhanced as the number of graphene layers is increased from 1 to 3 on n-Si substrates. For example, the spectral responsivity and the response speed of the fabricated device were found to be improved by about 15% (e.g., from 0.65 to 0.75 AW-1) and 50% (e.g., 14 to 7 μs), respectively, when three graphene layers are used as the hole-collecting cathode electrode. The experimentally obtained results showed that the device parameters, such as spectral responsivity and response speed of Gr/n-Si Schottky barrier photodiodes, can be boosted simply by increasing the number of graphene layers on n-Si substrates.Article Citation - WoS: 4Citation - Scopus: 4Light-Induced Modification of the Schottky Barrier Height in Graphene/Si Based Near-Infrared Photodiodes(Elsevier, 2022) Fidan, Mehmet; Dönmez, Gülçin; Yanılmaz, Alper; Ünverdi, Özhan; Çelebi, CemThe impact of light on the Schottky barrier height (SBH) in p-type graphene/n-type Si (p-Gr/n-Si) based near-infrared photodiodes is investigated. Hall effect and optoelectronic transport measurements carried out under illumination of 905 nm wavelength light showed that zero-bias SBH in such photodiodes can be effectively tuned in a range between 0.7 and 0.9 eV consistent with the variation in their open-circuit voltage. Shockley-Read-Hall model, which considers the charge recombination through mid-gap and interface states at the p-Gr/n-Si heterojunction, is used to explain the experimentally observed nonlinear dependence of SBH on the incident light. Light induced tunability of SBH at the graphene/semiconductor heterojunction is of great importance especially for the development of new generation optically driven devices in which graphene acts as a functioning element.Article Citation - WoS: 12Citation - Scopus: 17Junction Area Dependent Performance of Graphene/Silicon Based Self-Powered Schottky Photodiodes(Elsevier, 2021) Fidan, Mehmet; Ünverdi, Özhan; Çelebi, CemThis work reports the impact of junction area on the device performance parameters of Graphene/n-Silicon (Gr/n-Si) based Schottky photodiodes. Herein, three batches of Gr/n-Si photodiode samples were produced based on various sized CVD grown monolayer graphene layers transferred on individual n-Si substrates. The fabricated devices exhibited strong Schottky diode character and had high spectral sensi-tivity at 905 nm peak wavelength. The optoelectronic measurements showed that the spectral response of Gr/n-Si Schottky photodiodes has a linear dependence on the active junction area. The sample with 20 mm(2) junction area reached a spectral response of 0.76 AW(-1), which is the highest value reported in the literature for self-powered Gr/n-Si Schottky photodiodes without the modification of graphene electrode. In contrast to their spectral responsivities, the response speed of the samples were found to be lowered as a function of the junction area. The experimental results demonstrated that the device performance of Gr/n-Si Schottky photodiodes can be modified simply by changing the size of the graphene electrode on n-Si without need of external doping of graphene layer or engineering Gr/n-Si interface. This study may serve towards the standardization of junction area for the development of high performance Gr/Si based optoelectronic devices such as solar cells and photodetectors operating in between the ultraviolet and near-infrared spectral region. (C) 2021 Elsevier B.V. All rights reserved.Article Citation - WoS: 7Citation - Scopus: 7Mfm Imaging of Expanded Austenite Formed on 304 Ss and Cocrmo Alloys(Elsevier Ltd., 2014) Öztürk, Orhan; Fidan, Mehmet; Mändl, StephanNew data related to the magnetic nature of the expanded austenite layers on CoCrMo and austenitic stainless steel by nitrogen plasma immersion ion implantation (PIII) are presented. Implantations were performed in the temperature range between 300 and 550°C for a fixed processing time of 1h. Magnetic properties, nitrogen distribution, implanted layer phases, and surface topography were studied with a combination of experimental techniques involving magnetic force microscopy, SIMS, XRD, SEM and AFM. As a function of the processing temperature, phase evolution stage for both alloys follows the same trend: (1) initial stage of the expanded phase formation, γN; (2) its full development; and (3) its decomposition into CrN precipitates and the Cr-depleted matrix, fcc γ-(Co, Mo) for CoCrMo and bcc α-(Fe, Ni) for 304 SS. MFM imaging reveals distinct, stripe-like ferromagnetic domains for the fully developed expanded austenite layers both on CoCrMo and 304 SS alloys. Weak domain structures are observed for the CoCrMo samples treated at low and high processing temperatures. The images also provide strong evidence for grain orientation dependence of magnetic properties. The ferromagnetic state for the γN phase observed here is mainly linked to large lattice expansions due to high N content.