Physics / Fizik
Permanent URI for this collectionhttps://hdl.handle.net/11147/6
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Conference Object Citation - WoS: 3Citation - Scopus: 31/F Noise in Amorphous Silicon and Silicon-Germanium Alloys(SPIE, 2003) Johanson, Robert E.; Güneş, Mehmet; Kasap, Safa O.We report measurements of conductance noise of a-Si1-XGeX:H in two different geometries; one where the current flow is transverse to the surface and the other longitudinal to it. Because of the large increase in sample resistance in going from transverse to longitudinal conduction, it was not possible to measure both geometries at the same temperature. However, the temperature trends are compatible with a common noise source. For both geometries, alloying with up to 40% Ge reduces the noise magnitude by a factor of 50 over that found in a-Si:HConference Object Citation - WoS: 3Citation - Scopus: 3Light Induced Degradation of Hydrogenated Amorphous Silicon - Germanium Alloy (a-Sige:h) Thin Films(National Institute of Optoelectronics, 2005) Dönertaş, M. Elif; Güneş, MehmetHydrogenated amorphous silicon germanium alloy thin films prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) with varying Germanium concentrations have been investigated in both the annealed and the light soaked state. Samples were characterized using steady state photoconductivity and dual beam photoconductivity (DBP). The Staebler-Wronski effect has been investigated by monitoring the changes in the photoconductivity, σ ph, and the increase in the sub-bandgap absorption coefficient, α. The kinetics of defect creation for different germanium contents has also been compared with those for unalloyed hydrogenated amorphous silicon films. It is found that for the films with low Ge fraction, both a decrease in the photoconductivity and an increase in α (1.0eV) show similar time dependences to those observed in a-Si:H films. However, as the Ge content increases, σ ph degrades faster and the same time dependence is not seen in the increase of α(1.0eV).Conference Object Citation - WoS: 6Citation - Scopus: 101/F Noise in Hydrogenated Amorphous Silicon-Germanium Alloys(Institute of Electrical and Electronics Engineers, 2003) Johanson, Robert E.; Güneş, Mehmet; Kasap, Safa O.Measurements were made of conductance noise of a-Si:H and a-Si 1-xGex:H in two different geometries: one where the current flow is transverse to the surface and the other where it is longitudinal to the surface. Because of the large change in sample resistance between the two geometries, it was not possible to measure both geometries at the same temperature. For both geometries, alloyinzg with up to 40% Ge reduces the noise magnitude by several orders of magnitude over that found in a-Si:H. The decrease is incompatible with several popular noise models. Extrapolating the temperature trends for each geometry shows that it is possible that the noise observed in the transverse samples has the same origin as the higher frequency part of the double power law spectra observed in the longitudinal samples.Conference Object Citation - WoS: 76Citation - Scopus: 80Stability of Microcrystalline Silicon for Thin Film Solar Cell Applications(Institute of Electrical Engineers, 2003) Finger, Friedhelm; Carius, Reinhard; Dylla, Thorsten; Klein, Stefan; Okur, Salih; Güneş, MehmetThe development of microcrystalline silicon (μc-Si:H) for solar cells has made good progress with efficiencies better than those of amorphous silicon (a-Si:H) devices. Of particular interest is the absence of light-induced degradation in highly crystalline μc-Si:H. However, the highest efficiencies are obtained with material which may still include a-Si:H regions and light-induced changes may be expected in such material. On the other hand, material of high crystallinity is susceptible to in-diffusion of atmospheric gases which, through adsorption or oxidation, affect the electronic transport. Investigations are presented of such effects concerning the stability of μc-Si:H films and solar cells prepared by plasma-enhanced chemical vapour deposition and hot wire chemical vapour deposition.