1/F Noise in Hydrogenated Amorphous Silicon-Germanium Alloys
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BRONZE
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Yes
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Abstract
Measurements were made of conductance noise of a-Si:H and a-Si 1-xGex:H in two different geometries: one where the current flow is transverse to the surface and the other where it is longitudinal to the surface. Because of the large change in sample resistance between the two geometries, it was not possible to measure both geometries at the same temperature. For both geometries, alloyinzg with up to 40% Ge reduces the noise magnitude by several orders of magnitude over that found in a-Si:H. The decrease is incompatible with several popular noise models. Extrapolating the temperature trends for each geometry shows that it is possible that the noise observed in the transverse samples has the same origin as the higher frequency part of the double power law spectra observed in the longitudinal samples.
Description
Keywords
Amorphous silicon, Coplanar electrodes, Hydrogenation, Semiconducting germanium, Silanes, Spurious signal noise, Amorphous silicon, Coplanar electrodes, Hydrogenation, Silanes, Semiconducting germanium, Spurious signal noise
Fields of Science
0103 physical sciences, 02 engineering and technology, 0210 nano-technology, 01 natural sciences
Citation
Johanson, R. E., Güneş, M., and Kasap, S. O. (2003). 1/f noise in hydrogenated amorphous silicon-germanium alloys. IEE Proceedings: Circuits, Devices and Systems, 150(4), 345-349. doi:10.1049/ip-cds:20030749
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OpenCitations Citation Count
8
Volume
150
Issue
4
Start Page
345
End Page
349
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