Physics / Fizik
Permanent URI for this collectionhttps://hdl.handle.net/11147/6
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Article Citation - WoS: 4Citation - Scopus: 4Development of Single-Use Thin Film Electrodes Based on Zn2sno4 on In2o3:sno2 Substrates With Their Biosensing Applications(Elsevier, 2022) Yurttaş, Betül; Maral, Meltem; Erdem, Arzu; Özyüzer, LütfiDopamine (DA) has a significant impact on the emergence and treatment of certain diseases (e.g., Alzheimer's and Parkinson's diseases). Therefore, monitoring of DA is important, and using biosensors is a favorable option instead of time-consuming and expensive conventional methods. In biosensor manufacturing, thin films have become a rapidly emerging field. In this study, a non-enzymatic electrochemical biosensor based on thin film electrodes is developed for monitoring DA levels. The thin film electrodes (ZTO/ITO) are developed by deposition of Zn2SnO4 (ZTO) on In2O3:SnO2 (ITO) substrates by magnetron sputtering. 3-aminopropyltriethoxysilane (APTES) is used to modify the surface of these electrodes. Physical, optical, and structural properties of the electrodes are determined by applying surface profilometry, UV–VIS–NIR spectrophotometry, X-ray diffraction (XRD), and scanning electron microscopy (SEM) measurements. According to these measurements, it has been observed that the ZTO/ITO combination has a higher optical transmission value than the bare ITO, depending on the deposition time and the oxygen concentration used during ZTO deposition. In addition, the ITO thin film has a crystalline structure, while the ZTO thin film has an amorphous structure and both thin films have a good surface morphology. As electrochemical analysis, cyclic voltammetry (CV), electrochemical impedance spectroscopy (EIS), and differential pulse voltammetry (DPV) measurements are performed. As a result of CV and EIS measurements, a remarkable change (63.54%) was observed after applying APTES modification onto the surface of ZTO/ITO electrode, and the ones obtained by DPV showed successful detection of DA by APTES modified ZTO/ITO. In addition, the experiments in the presence of interferences such as ascorbic acid (AA), uric acid (UA), bovine serum albumin (BSA), and fish sperm double-stranded DNA (fsDNA) show that the electrodes can be successfully applied for voltammetric determination of DA. The detection limit of DA was estimated to be 0.013 µM in the range of DA between 0.1 and 1 µM, and sensitivity was calculated and found to be 11.057 μA μg−1 mL cm−2, which means ZTO/ITO electrodes have a good sensitivity.Article Citation - WoS: 21Citation - Scopus: 24Effect of Defects and Secondary Phases in Cu2znsns4 Absorber Material on the Performance of Zn(o,s) Buffered Devices(Elsevier Ltd., 2019) Türkoğlu, Fulya; Köseoğlu, Hasan; Cantaş, Ayten; Akça, Fatime Gülşah; Meriç, Ece; Buldu, Dilara Gökçen; Aygün, GülnurCopper zinc fin sulfide (CZTS) absorber layer attracts so much attention in photovoltaic industry since it contains earth abundant, low cost and non-toxic elements contrary to other chalcogenide based solar cells. In the present work, CZTS absorber layers were prepared following a two-stage process: firstly, a stack of metal precursors (Copper (Cu)/Tin (Sn)/Zinc (Zn)/Copper (Cu)) were deposited on molybdenum (Mo) substrate by magnetron sputtering, then this stack was annealed under S atmosphere inside a tubular furnace. CZTS thin films were investigated using energy dispersive X-ray spectroscopy, X-ray diffraction, scanning electron microscopy and Raman spectroscopy. The effect of sulfurization time and the thickness of top and bottom Cu layer in precursors on the properties of CZTS thin films were investigated. The importance of Cu thickness adjacent to Sn to avoid detrimental phases was addressed. The significance of sulfurization time to restrict the Sn and Zn losses, formation of oxides such as fin dioxide and zinc oxide, and formation of molybdenum disulfide and voids between Mo/CZTS interface was also addressed. Moreover, cadmium sulfide buffer layer, which is conventionally used in CZTS solar cells, is replaced by an environmentally friendly alternative zinc oxysulfide buffer layer.Article Citation - WoS: 33Citation - Scopus: 33Characterization of Thin Film Li0.5la0.5ti1-Xalxo3 Electrolyte for All-Solid Li-Ion Batteries(Elsevier, 2018) Ulusoy, Seda; Gülen, Sena; Aygün, Gülnur; Özyüzer, Lütfi; Özdemir, MehtapSince addition of Al in Li0.5La0.5TiO3 has enhanced ionic conductivity in bulk materials, it is important to apply this material on all solid state thin film batteries. Because some of the good ionic conductors such as Lithium Phosphorus Oxynitride (LiPON) are sensitive to oxygen and moisture and their application is limited, so amorphous Li0.5La0.5Ti1−xAlxO3 (LLTAlO) is a most promising candidate because of its stability. In this study, the crystalline LLTAlO targets were prepared changing the amount of x content by conventional solid state reactions. Using these targets, lithium lanthanum titanium oxide (LLTO) thin film electrolytes were deposited on ITO/SLG substrates by radio frequency magnetron sputtering system in Ar atmosphere. The structural and compositional properties of targets and thin films were characterized by SEM, XRD, Raman spectroscopy and XPS. It was found that all targets are crystalline while the thin films are amorphous. To understand the effect of Al doping on ionic conductivity, electrical measurements were done at room temperature by AC impedance spectroscopy forming ITO/LLTAlO/Al structure like capacitor. Highest ionic conductivity result, 0.96 × 10−6 S·cm−1, is obtained from the nominal thin film composition of Li0.5La0.5Ti1−xAlxO3 (x = 0.05) at room temperature measurements. Heat treatment is also conducted to investigate to understand its effect on ionic conductivity and the structure of the thin films. It is found that ionic conductivity enhances with annealing. Also, temperature dependent ionic conductivity measurements from 298 K to 385 K are taken in order to evaluate activation energy for Li-ion conduction.Article Citation - WoS: 42Citation - Scopus: 46Importance of Cds Buffer Layer Thickness on Cu2znsns4-Based Solar Cell Efficiency(IOP Publishing Ltd., 2018) Cantaş, Ayten; Türkoğlu, Fulya; Meriç, Ece; Akça, Fatime Gülşah; Özdemir, Mehtap; Tarhan, Enver; Özyüzer, Lütfi; Özyüzer, Gülnur AygünCu2ZnSnS4 (CZTS) thin films were grown on Mo-coated soda lime glass (SLG) substrates by the sulfurization of DC magnetron-sputtered Zn, Sn and Cu metallic precursors under a sulfur atmosphere at 550 °C for 45 min. Understanding the composition and structure of the CZTS absorber layer is necessary to obtain efficient solar cells. With this aim, x-ray diffractometry, Raman spectroscopy, scanning electron microscopy, energy dispersive spectroscopy and x-ray photoelectron spectroscopy were used to investigate the CZTS absorber layers. CZTS absorber films were obtained and found to be Cu-poor and Zn-rich in composition, which are both qualities desired for efficient solar cells. CdS was used as a buffer layer and was grown by the chemical bath deposition technique. The optical properties of CdS films on SLG were searched for using a spectroscopic ellipsometer and the results revealed that the bandgap increases with film thickness increment. CZTS-based solar cells with different CdS buffer layer thicknesses were prepared using a SLG/Mo/CZTS/CdS/ZnO/AZO solar cell configuration. The influence of the CdS buffer layer thickness on the performance of the CZTS solar cells was investigated. Device analysis showed that electrical characteristics of solar cells strongly depend on the buffer layer's thickness. Highly pronounced changes in V OC, fill factor and J SC parameters, which are the main efficiency limiting factors, with changing buffer layer thicknesses were observed. Our experiments confirmed that decreasing the CdS thickness improved the efficiency of CZTS solar cells down to the lowest thickness limit.Article Citation - WoS: 7Citation - Scopus: 7Comparative Study of Annealing and Gold Dopant Effect on Dc Sputtered Vanadium Oxide Films for Bolometer Applications(Springer Verlag, 2017) Alaboz, Hakan; Demirhan, Yasemin; Yüce, Hürriyet; Aygün, Gülnur; Özyüzer, LütfiVanadium oxide (VOx) thin film has been widely used for IR detectors and it is one of the promising materials for THz detectors due to its high temperature coefficient of resistance (TCR) values. VOx films with proper TCR values have also high resistance and it restricts bolometer performance especially for uncooled bolometers. To overcome this problem, deposition at elevated temperatures or annealing approach has been accepted and used but gold co-deposition approach has been proposed recently. In this study, vanadium oxide films were fabricated on high resistivity silicon substrates by reactive direct current magnetron sputtering in different O2/Ar atmosphere at room temperature. We investigated influence of oxygen partial pressure during deposition process and fabricated VOx thin films with sufficient TCR values for bolometer applications. In order to decrease resistivity of the deposited films, post annealing and gold doping approaches were performed separately. Effect of both post annealing process and gold doping process on structural and electrical properties of VOx thin films deposited at room temperature were investigated and detailed comparison between these methods were presented. We obtained the best possible approach to obtain optimum conditions for the highly reproducible VOx thin films which have the best resistivity and suitable TCR value for bolometer applications.Article Citation - WoS: 10Citation - Scopus: 10In-Situ Spectroscopic Ellipsometry and Structural Study of Hfo2 Thin Films Deposited by Radio Frequency Magnetron Sputtering(American Institute of Physics, 2014) Cantaş, Ayten; Özyüzer, Gülnur Aygün; Basa, Deepak KumarWe have investigated the reduction of unwanted interfacial SiO2 layer at HfO2/Si interface brought about by the deposition of thin Hf metal buffer layer on Si substrate prior to the deposition of HfO2 thin films for possible direct contact between HfO2 thin film and Si substrate, necessary for the future generation devices based on high-κ HfO2 gate dielectrics. Reactive rf magnetron sputtering system along with the attached in-situ spectroscopic ellipsometry (SE) was used to predeposit Hf metal buffer layer as well as to grow HfO2 thin films and also to undertake the in-situ characterization of the high-κ HfO2 thin films deposited on n-type 〈100〉 crystalline silicon substrate. The formation of the unwanted interfacial SiO2 layer and its reduction due to the predeposited Hf metal buffer layer as well as the depth profiling and also structure of HfO2 thin films were investigated by in-situ SE, Fourier Transform Infrared spectroscopy, and Grazing Incidence X-ray Diffraction. The study demonstrates that the predeposited Hf metal buffer layer has played a crucial role in eliminating the formation of unwanted interfacial layer and that the deposited high-κ HfO2 thin films are crystalline although they were deposited at room temperature.