Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
Permanent URI for this collectionhttps://hdl.handle.net/11147/7148
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Article Citation - WoS: 4Citation - Scopus: 5Enhanced Optoelectronic Properties of Magnetron Sputtered Ito/Ag Multilayers by Electro-Annealing(AVS, 2022) Uyanık, Zemzem; Türkoğlu, Fulya; Köseoğlu, Hasan; Ekmekçioğlu, Merve; Ata, Bengü; Demirhan, Yasemin; Özdemir, Mehtap; Aygün, Gülnur; Özyüzer, LütfiIndium tin oxide/silver/indium tin oxide (ITO/Ag/ITO) multilayers have attracted much attention to fulfill the growing need for high-performance transparent conducting oxide electrodes. To make these transparent multilayers work better, electro-annealing, which is a method of self-heating by electric current, can be effective. Moreover, the effect of current on ITO/Ag/ITO multilayers should be investigated to make sure that electronic devices will be reliable over their lifetime. In this study, ITO/Ag/ITO multilayer electrodes with varying Ag thicknesses were grown by DC magnetron sputtering at room temperature. Structural, optical, and electrical properties of these multilayers were investigated before and after electro-annealing. Measurement results revealed that improved optical transmittance and sheet resistance can be obtained by the optimization of Ag thickness for the as-grown ITO/Ag/ITO layers. The highest figure of merit (FoM) value of 17.37 × 10−3 Ω−1 with optical transmittance of 85.15% in the visible region and sheet resistance of 11.54 Ω/□ was obtained for the Ag thickness of 16.5 nm for as-grown samples. The electro-annealing of as-grown ITO/Ag/ITO multilayers led to improved optical behavior of the multilayer structure over a wide spectral range, especially in the near-infrared range. Electro-annealing also provided an improvement in the crystallinity and sheet resistance of the electrodes. The improvement of the electrical and optical properties of the structure enabled a FoM of 23.07 × 10−3 Ω−1 with the optical transmittance of 86.80% in the visible region and sheet resistance of 10.52 Ω/□. The findings of this work provide proper knowledge of the properties of ITO/Ag/ITO multilayers under electrical current and suggest that the overall performance of the multilayers can be improved by the electro-annealing process.Article Citation - WoS: 5Citation - Scopus: 4The Effect of Annealing Temperature on the Optical Properties of a Ruthenium Complex Thin Film(Elsevier Ltd., 2016) Ocakoğlu, Kasım; Okur, Salih; Aydın, Hasan; Emen, Fatih MehmetThe stability of the optical parameters of a ruthenium polypyridyl complex (Ru-PC K314) film under varying annealing temperatures between 278 K and 673 K was investigated. The ruthenium polypyridyl complex thin film was prepared on a quartz substrate by drop casting technique. The transmission of the film was recorded by using Ultraviolet/Visible/Near Infrared spectrophotometer and the optical band gap energy of the as-deposited film was determined around 2.20 eV. The optical parameters such as refractive index, extinction coefficient, and dielectric constant of the film were determined and the annealing effect on these parameters was investigated. The results show that Ru PC K314 film is quite stable up to 595 K, and the rate of the optical band gap energy change was found to be 5.23 × 10- 5 eV/K. Furthermore, the thermal analysis studies were carried out in the range 298-673 K. The Differential Thermal Analysis/Thermal Gravimmetry/Differantial Thermal Gravimmetry curves show that the decomposition is incomplete in the temperature range 298-673 K. Ru-PC K314 is thermally stable up to 387 K. The decomposition starts at 387 K with elimination of functional groups such as CO2, CO molecules and SO3H group was eliminated between 614 K and 666 K.Article Citation - WoS: 60Citation - Scopus: 64Improvement of Optical and Electrical Properties of Ito Thin Films by Electro-Annealing(Elsevier Ltd., 2015) Köseoğlu, Hasan; Türkoğlu, Fulya; Kurt, Metin; Yaman, Mutlu Devran; Akça, Fatime Gülşah; Aygün, Gülnur; Özyüzer, LütfiThe effect of electro-annealing in vacuum and air on the optical and electrical properties of ITO thin films grown by large area DC magnetron sputtering was investigated. Moreover, the performances of the electro-annealed ITO thin films in vacuum and air were compared. Electro-annealing was performed by applying 0.75, 1.00, 1.25 and 1.50 A constant ac current to the ITO thin films. It was observed that the crystallinity of the films was better for the ITO thin films electro-annealed in vacuum. The changes in sheet resistance of electro-annealed ITO thin films with applied currents were detailed. The transmittance of the films increased for both electro-annealing in vacuum and air. A correlation between band-gap and resistivity for all of the electro-annealed thin films was observed.Article Citation - WoS: 18Citation - Scopus: 18The Effects of the Post-Annealing Time on the Growth Mechanism of Bi2sr2ca1cu2o8+ Thin Films Produced on Mgo (100) Single Crystal Substrates by Pulsed Laser Deposition (pld)(Elsevier Ltd., 2016) Nane, Onur; Özçelik, Bekir; Abukay, DoğanBi2Sr2Ca1Cu2O8+δï thin films were deposited on MgO (100) substrates by pulsed laser deposition (PLD). The effects of post-annealing time on the phase formation, the structural and superconducting properties of the films have been investigated by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), temperature dependent resistivity (R-T), atomic force microscopy (AFM), and DC magnetization measurements. The films deposited at 600 °C were post-annealed in an atmosphere of a gas mixture of Ar (93%) and O2 (7%), at 860 °C for 10, 30, and 60 min. All films have demonstrated a mainly single phase of 2212 with a high crystallinity (FWHM0.159°) and c-axis oriented. The critical temperature, TC, of the films annealed for 10, 30, and 60 min were obtained as 77, 78, and 78 K, respectively. The highest critical current density, JC, was calculated as 3.34×107 A/cm2 for the film annealed at 860 °C for 30 min at 10 K.Conference Object Citation - WoS: 2Citation - Scopus: 3The Effects of Oxide Thickness on the Interface and Oxide Properties of Metal-Tantalum Pentoxide-Si (mos) Capacitors(National Institute of Optoelectronics, 2005) Özdağ, Pınar; Atanassova, Elena; Güneş, MehmetHigh dielectric constant tantalum-pentoxide insulating layers were prepared on p-type (100) crystalline silicon wafers using an RF magnetron sputtering technique. Then, metal-oxide-semiconductor (Al-Ta 2O 5-Si) structures were formed with various oxide thickness from 15 to 25 nm. Devices were characterized using the high frequency capacitance-voltage (C-V) spectroscopy method. From the analysis of the high frequency C-V curves, non-ideal effects such as oxide charges and interface trap densities have been evaluated. The results for Ta 2O 5 layers have been compared with those for conventional SiO 2 layers. Interface trap densities were found to be 1.6 ± 0.4×10 12 eV -1 cm -2 for Ta 2O 5 and about 2×10 11 eV -1 cm -2 for SiO 2 insulating layers. There was no clear thickness dependence of the interface trap densities for the Ta 2O 5 insulating layers.Article Citation - WoS: 3Citation - Scopus: 3Tunneling Spectroscopy of Heavily Underdoped Crystals of Bi2sr2cacu2o8-?(Elsevier Ltd., 2000) Özyüzer, Lütfi; Zasadzinski, John F.; Miyakawa, Nobuaki; Kendziora, Christopher A.; Sha, J.; Hinks, David G.; Gray, Kenneth E.Crystals of Bi2Sr2CaCu2O8+δ with optimal Tc=95 K have been underdoped using two different methods and the superconducting gaps have been obtained by tunneling. In some cases, three different tunneling geometries have been utilized: point contact, STM and break junctions. The first doping method involves control of the oxygen content by annealing in various partial pressures of oxygen. These crystals exhibit a narrow spread of gap values over a wide doping range from overdoped (Tc=56 K) to underdoped with Tc=70 K. However, for underdoped crystals with Tc midpoints in the range 25 K - 63 K, there is a dramatic increase in the spread of gap values which may signal the development of static phase separation of either chemical or electronic origin. To avoid possible chemical phase separation, we have explored another doping procedure which incorporates Dy substitution on the Ca site. These crystals exhibit a relatively narrow superconducting transition width and some preliminary tunneling spectra will be presented.Article Citation - WoS: 37Citation - Scopus: 41Differences in the Densities of Charged Defect States and Kinetics of Staebler-Wronski Effect in Undoped (nonintrinsic) Hydrogenated Amorphous Silicon Thin Films(American Institute of Physics, 1997) Güneş, Mehmet; Wronski, Christopher R.A variety of undoped (nonintrinsic) hydrogenated amorphous silicon (a-Si:H) thin films was studied in greater detail using steady-state photoconductivity, σph, subband-gap absorption, α(hν), steady-state photocarrier grating (SSPG), and electron-spin-resonance (ESR) techniques both in the annealed and stabilized light soaked states. The experimental results were self-consisiently modeled using a detailed numerical analysis. It was found that large differences in the optoelectronic properties of device quality a-Si:H thin films can only be explained using a gap slate distribution which consists of positively charged D+ defect states above the Fermi level, the neutral D0 defect states, and the negatively charged D- defect states below the Fermi level. There are large differences both in the densities of neutral and charged defect states and R ratios in different a-Si:H films in the annealed state. The densities of both neutral and charged defect states increased, however, R ratios decreased in the stabilized light soaked state. Very good agreement was obtained between the densities of neutral defect states measured by ESR and those derived from the numerical analysis in the stabilized light soaked state. The kinetics of the Staebler-Wronski effect was also investigated. There was no direct correlation between the decrease of steady-state photoconductivity and increase of subband-gap absorption. The self-consistent fits to wide range of experimental results obtained with the three Gaussian distributions of charged defect states imply that this model is much better representation of the bulk defect states in undoped hydrogenated amorphous silicon thin films.