Znte/Gaas(2 1 1)b Heterojunction Valence Band Discontinuity Measured by X-Ray Photoelectron Spectroscopy
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BRONZE
Green Open Access
Yes
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No
Abstract
Thin ZnTe layers were grown by molecular beam epitaxy on single crystal GaAs(2 1 1)B substrates. Reflection high energy electron diffraction monitored the deoxidation of substrate and entire growth process. Valence band offset was calculated with X-ray photoelectron spectroscopy. Also interface formation of the ZnTe/GaAs was studied. Analysis shows that interface is abrupt and calculated valance band offset is 0.25±0.1 eV and indicates type I alignment. The experimental result agrees well with the theoretical predictions involving interface dipole effect as well as electron affinity rule.
Description
Keywords
Valence band offset, XPS, Strain, Intermixing, Epitaxy, Intermixing, XPS, Valence band offset, Strain, Epitaxy
Fields of Science
0103 physical sciences, 02 engineering and technology, 0210 nano-technology, 01 natural sciences
Citation
Wang, X. J., Tarı, S., Sporken, R., and Sivananthan, S. (2011). ZnTe/GaAs(2 1 1)B heterojunction valence band discontinuity measured by X-ray photoelectron spectroscopy. Applied Surface Science, 257 (8), 3346-3349. doi:10.1016/j.apsusc.2010.11.019
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OpenCitations Citation Count
1
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Volume
257
Issue
8
Start Page
3346
End Page
3349
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CrossRef : 1
Scopus : 2
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